磁控溅射制备的W，WSi<sup>2</sup>, Si单层膜和W/Si,WSi<sup>2</sup>/Si多层膜应力

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磁控溅射制备的W，WSi², Si单层膜和W/Si,WSi²/Si多层膜应力

1.
Institute of Precision Optical Engineering,Department of Physics,Tongji University,Shanghai 200092,China;.Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Tongji University,Shanghai 200092,China;.Research Center of Laser Fusion,CAEP,P.O.Box 919-987,Mianyang 621900,China

摘要: 采用直流磁控溅射技术制备了厚度约100 nm的W,WSi2,Si单层膜和周期约为20 nm，Si膜层厚度与周期的比值为0.5的W/Si,WSi2/Si周期多层膜。利用台阶仪对镀膜前后基底表面的面形进行了测试，计算并比较了不同膜系的应力值。结果表明：W单层膜表现出较大的压应力，而W/Si周期膜则表现为张应力。WSi2单层膜和WSi2/Si周期多层膜均表现为压应力，没有应力突变，应力特性最为稳定。因此，WSi2/Si材料组合是研制大膜对数X射线多层膜较好的材料组合。
- 应力 /
- 形变 /
- 多层膜 /
- 磁控溅射 /
- X射线
Abstract: A series of W, WSi2, Si thin films and W/Si, WSi2/Si periodic multilayers were fabricated by using DC magnetron sputtering technology. Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated. The results indicate that W thin films show relatively large compressive stress, while W/Si multilayers show tensile stress. Both WSi2 thin films and WSi2/Si periodic multilayers show compressive stress. WSi2/Si periodic multilayers have the most stable stress state with no sharp change, and is a good material combination for X-ray multilayer optics with a large number of bilayers.
- stress /
- deformation /
- multilayer /
- magnetron sputtering /
- x-ray