闪光照相中MeV级网栅的设计
Design of MeV anti-scatter grid in flash radiography
-
摘要: 通过理论分析,确定了MeV级多孔网栅的设计目标、拟采用的照相布局及图像接收系统。在此基础上,通过蒙特卡罗模拟和理论分析,确定了网栅的主要参数,包括网栅厚度、孔径与孔间距和W薄片厚度,并研究了加工误差和非理想照相因素对网栅性能的影响,最后给出了原理样机的设计参数。针对原理样机开展了数值模拟,利用模拟图像进行了网栅图像修补与插值等图像预处理工作,初步验证了原理样机在实际应用中的可行性。Abstract: Scattered radiation, which seriously decreases the precision of image reconstruction in high energy flash X-ray radiography, can be largely diminished by anti-scatter grid. The design aim of MeV anti-scatter grid is firstly presented, and the radiographic system layout and the imaging system are given using theoretic analysis. Then parameters of anti-scatter grid, such as the total thickness, aperture and space between holes, and the thickness of W thin foil with small holes, are detailed using Monte Carlo simulation and analysis. Effects of the machining error and imperfect alignments of radiographic components on the performance of MeV anti-scatter grid are also discussed, and design parameters of the prototype of anti-scatter grid are presented. With the designed anti-scatter grid, the
-
Key words:
- mev anti-scatter grid /
- scatter /
- monte carlo simulation /
- flash radiography
点击查看大图
计量
- 文章访问数: 1891
- HTML全文浏览量: 319
- PDF下载量: 581
- 被引次数: 0