双脉冲电子束源实验研究
Experimental research on a double pulsed beam source
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摘要: 利用现有2MeV直线感应注入器,通过改造,将其次级功率源和8个感应腔分成2组,使之交替工作,建立了一台双脉冲电子束源。二极管电压脉冲幅度达到1MeV,电子束脉冲持续时间为120ns,脉冲间隔可以根据需要在100~500ns间进行调节。实验结果表明:该双脉冲电子束源可以产生双脉冲电子束,其电压幅度差值小于2%,束流可达3kA,并且工作稳定,利用该装置可以进行多脉冲二极管物理和天鹅绒多脉冲发射特性实验研究。Abstract: A double pulsed beam generator is built based on 2MeV linear induction accelerator (LIA) injector. The second power source and 8 inductive cells of the injector are divided into two groups and work alternatively. Electron energy of each beam is up to 1MeV and the beam duration is 120ns with adjustable pulse interval (from 200ns to 800ns). The voltage amplitude difference of the two pulses can be less than 2%. The electron beams are emitted from a velvet cathode in a vacuum diode. The beam currents are up to 3kA, measured both by a Faraday cup in anode hole and by a shunt resistor at the rail of the LIA injector. This device can be used to study multi-pulse diode physics and emitting physics of different materials under multi-pulse mode.
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Key words:
- double pulsed electron beam source /
- vacuum diode /
- velvet cathode
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