一步法紫外曝光制备TiO2光敏凝胶光栅的初步研究
Single-step fabrication of diffraction grating on TiO2 photosensitive gels film by direct UV irradiation
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摘要: 以钛酸丁酯和苯甲酰丙酮为原料，经sol-gel工艺，获得具有负性光刻胶性质的TiO2光敏凝胶薄膜。它的敏感波长在360nm附近，与反应生成的螯合环有关。结合掩模曝光和显影工艺，将条状或网格状的光栅图形引入光敏凝胶表面，获得光敏凝胶光栅。Abstract: TiO２ photosensitive gel films are derived from chemically modified metalalkoxide with benzoylacetone by sol-gel process. The gel films show an absorption band at around 360 nm, characteristic of the remaining chelate rings. The negative tone gel films are irradiated by UV light through a mask with different pattern to prepare grating pattern on gel films. Depending on the exposure time, the gel films are leaching with ethanol and the grating with different structure on TiO2 photosensitive gel films are obtained．
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Key words:
- photosensitive gel /
- uv irradiation /
- phase mask /
- sol-gel technology
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