太赫兹金属双光栅超厚胶光刻工艺

单云冲; 阮久福; 杨军; 邓光晟; 吕国强

doi:10.11884/HPLPB201426.053102

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太赫兹金属双光栅超厚胶光刻工艺

doi: 10.11884/HPLPB201426.053102

单云冲^1,2,3,
阮久福^1,2,
杨军^1,2,
邓光晟^1,2,
吕国强^1,2, ,

1.
特种显示技术教育部重点实验室合肥工业大学, 合肥 230009;
2.
合肥工业大学光电技术研究院, 合肥 230009;
3.
合肥工业大学仪器科学与光电工程学院, 合肥 230009

详细信息

通讯作者:
吕国强

计量
- 文章访问数: 1060
- HTML全文浏览量: 145
- PDF下载量: 307
- 被引次数: 0
出版历程
- 收稿日期: 2013-07-02
- 修回日期: 2014-01-09
- 刊出日期: 2014-05-04

Terahertz metal bi-grating fabrication using ultra-thick photoresist process

Shan Yunchong^1,2,3,
Ruan Jiufu^1,2,
Yang Jun^1,2,
Deng Guangsheng^1,2,
Lv Guoqiang^{1,2
, ,}

1.
Key Laboratory of Special Display TechnologyHefei University of Technology,Ministry of Education,Hefei 230009,China;
2.
Academy of Photoelectric Technology,Hefei University of Technology,Hefei 230009,China;
3.
School of Instrument Science and Opto-electronic Engineering,Hefei University of Technology,Hefei 230009,China

摘要

摘要: 介绍了制备某太赫兹频率真空辐射光栅的超厚胶光刻工艺，针对工艺中的难点(大厚度和高深宽比)展开了深入分析。实验分析了基片处理、涂胶、前烘、曝光、后烘、显影等工艺过程对光刻的影响，通过优化工艺参数，解决了胶膜脱落、开裂，不同胶层间的结合，光栅沟槽间的光刻胶残留等问题，成功制备了厚度为700 m、深宽比为14的侧壁陡直、表面平整的双光栅结构胶膜。
- 双光栅 /
- 太赫兹 /
- 光刻 /
- 超厚胶 /
- 深宽比
Abstract: As a key part of terahertz vacuum electronic device, metal grating cant be fabricated using traditional methods due to its tiny dimension. The photoetching process of metal bi-grating for radiation source at some terahertz band was presented. The influence of the procedure (including substrate preparation, spin-coating, pre-bake, exposure, post-bake and developing) on photoetching was analyzed experimentally. The problems such as film drop and crack, films combination and the photoresist remaining at gaps which were caused by thick film and high aspect ratio, were solved by the optimizing the process parameters. Finally, a good film microstructure with steep side wall and smooth surface was achieved, with a thickness of 700 m and an aspect ratio of 14. The work presented in this paper provides a technological guide to the similarly related project.
- bi-grating /
- terahertz /
- photoetching /
- ultra-thick photoresist /
- aspect ratio