Laser conditioning effect of HfO2/SiO2 high reflectors at 532 nm
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摘要: 采用单台阶能量光栅扫描以及R-on-1测试两种不同预处理方式研究了激光预处理技术对532 nm HfO2/SiO2高反膜的阈值提升效果。用Nd:YAG二倍频激光对电子束蒸发制备的532 nm HfO2/SiO2高反膜进行1-on-1损伤阈值测试，然后分别进行单台阶能量光栅扫描以及R-on-1测试。通过对损伤概率以及损伤形貌的分析，发现激光预处理能够去除薄膜内低阈值缺陷，达到提高损伤阈值的目的，损伤阈值分别提高38%和30%。Abstract: Two different laser conditioning methods including n% raster scanning and R-on-1 test were conducted to investigate the conditioning effect of 532 nm high reflectors. The Nd: YAG second harmonic laser was employed to do 1-on-1 test for 532 nm high reflectors prepared by electron beam evaporation. Afterwards, n% raster scanning and R-on-1 test were done for comparison. The analysis of damage probability and damage morphologies shows that, laser conditioning could eliminate the defects with low threshold in coatings, thus enhancing the laser damage threshold of 532 nm high reflectors (by 38% and 30% in n% raster scanning and k-on-1 test, respectively).
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