原位溅射型单次试开密码鉴别电路

王宇航; 高杨; 韩宾; 贾乐

doi:10.11884/HPLPB201628.160140

原位溅射型单次试开密码鉴别电路

doi: 10.11884/HPLPB201628.160140

王宇航^1,4,
高杨^2,3,
韩宾¹,
贾乐¹

1.
西南科技大学信息工程学院, 四川绵阳 621 01 0;
2.
中国工程物理研究院电子工程研究所, 四川绵阳 621 999;
3.
重庆大学新型微纳器件与系统技术国防重点学科实验室, 重庆 400044;
4.
核探测与核电子学国家重点实验室, 北京 1 00049

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出版历程
- 收稿日期: 2016-05-17
- 修回日期: 2016-07-12
- 刊出日期: 2016-11-15

In-situ sputtering type single-try discriminator circuit

1.
School of Information Engineering,Southwest University of Science and Technology,Mianyang 621010,China;
2.
Institute of Electronic Engineering,China Academy of Engineering Physics,Mianyang 621999,China;
3.
National Key Laboratory of Fundamental Science of Micro/Nano-Device and System Technology,Chongqing University,Chongqing 400044,China;
4.
State Key Laboratory of Particle Detection and Electronics,Institute of High Energy Physics,Chinese Academy of Sciences,Beijing 100049,China

摘要

摘要: 针对目前微机电系统密码锁中的鉴别器结构复杂、智能电子密码锁可靠性不高的问题，设计了一种N bit的原位溅射型单次试开密码鉴别电路。N bit的密码鉴别电路，由2N(N级、每级2个)个原位溅射型OFF-ON开关按照每级二选一的逻辑、N级级联的形式构成；将原位溅射型OFF-ON开关(OFF态到ON态的单向切换具有不可逆特性)与具有熔断特性的保险丝按照装定密码对应的电路关系进行连接，构成了原位溅射型单次试开固态密码锁，可将此密码锁用于对安全性要求高的要害系统、设施中。为了获得原位溅射型OFF-ON开关中金属爆炸箔与叉指电极之间的间隙，给出了三种固态密码鉴别电路的微加工工艺方案。
- 微电子机械系统 /
- 原位溅射 /
- 鉴别电路 /
- 密码锁 /
- 单次试开
Abstract: As the structure of discriminator in the current micro-electromechanical system combination lock is complex and the reliability of electronic combination locks is poor, we designed an N bit in-situ sputtering single-try discrimination circuit to solve these problems. The N bit discrimination circuit is composed of 2N (N-stage, two switches per stage) sputtering type OFF-ON switches and formed by alternative logic of each stage and N-stage series. The sputtering type OFF-ON switches (the one-way switch of the OFF state to ON state is irreversible) and the fuse having a fusing characteristic are connected by the corresponding relationship between setting password and the circuit to form in-situ sputtering and single-try solid combination lock which can be used in high security key systems and facilities. In order to ensure a space between the metal exploding foil and the interdigital electrode, three different micromachining process methods of the discrimination circuit are presented.
- micro-electro-mechanical systems /
- sputtering /
- discriminator circuit /
- combination lock /
- single-try