双极性脉冲磁控溅射电源设计

李波; 李博婷; 叶超; 谭巍巍; 黄斌; 赵娟; 鲁向阳; 黄宇鹏; 张信; 齐卓筠; 康传会

doi:10.11884/HPLPB201830.170393

双极性脉冲磁控溅射电源设计

doi: 10.11884/HPLPB201830.170393

李波^1,,
李博婷²,
叶超¹,
谭巍巍²,
黄斌¹,
赵娟^1, ,,
鲁向阳²,
黄宇鹏¹,
张信¹,
齐卓筠¹,
康传会¹

1.
中国工程物理研究院流体物理研究所, 四川绵阳 621900
2.
北京大学物理学院, 北京 100871

基金项目:

国防基础科研项目 B1520132002

详细信息

作者简介:
李波(1986-)，男，从事大电流特种电源研究；lbjoyxnh1057@yeah.net

通讯作者:
赵娟(1968-)，女，高级工程师，从事脉冲功率技术研究；zj680525@21cn.com

中图分类号: TN86
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- 被引次数: 0
出版历程
- 收稿日期: 2017-10-10
- 修回日期: 2017-11-14
- 刊出日期: 2018-04-15

Design of bipolar pulsed magnetron sputtering power supply

1.
Key Laboratory of Pulsed Power, Institute of Fluid Physics, CAEP, P.O.Box 919-107, Mianyang 621900, China
2.
School of Physics, Peking University, Beijing 100871, China

摘要

摘要: 双极性脉冲电源是磁控溅射系统中的关键设备之一。根据铌溅射处理装置的技术要求，研制了一套输出电压0~800 V可调、脉冲宽度20~200 μs可调、频率0~60 Hz可调、脉冲电流最大幅值约150 A的双极性脉冲电源，分别给出了该电源在水电阻负载和等离子体负载下的实验结果。设计上采用DSP控制开关电源的方式对储能电容器进行恒流充电；综合应用FPGA，PLC及触摸屏组成人机交互系统，控制输出光脉冲信号，经负压偏置驱动后使桥式结构的脉冲形成网络产生正负交替双极性脉冲。通过大量实验论证，该电源解决了等离子体负载放电打弧等问题，达到了理想的溅射效果，满足了指标要求。
- 双极性脉冲 /
- FPGA /
- 桥式脉冲形成网络 /
- 等离子体
Abstract: Bipolar pulsed power supply is one of the key equipment in magnetron sputtering system. Based on the working principle and technical characteristics of magnetron sputtering, a bipolar pulsed power supply with output voltage of 0-800 V, pulse width of 20-200 μs, frequency of 0-60 Hz, maximum pulse current of 150 A was developed, and the experimental results for the power supply with the water resistance load and the plasma load were obtained. The charging to the energy storage capacitor in the bipolar pulsed power supply was controlled by the DSP control mode. Integrating FPGA, PLC and touch screen man-machine exchange system, the bipolar pulses were got. A large number of experimental demonstration shows that the power supply solves the problems of plasma load discharge et al., and the designed bipolar pulsed power supply achieves the desired sputtering effect and fulfills the requirements of the technical index.
- bipolar pulse /
- FPGA /
- pulse forming network /
- plasma

HTML全文

图 1 系统总体结构图

Figure 1. Overall structure of system

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图 2 脉冲形成电路原理

Figure 2. Schematic of pulse forming circuit

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图 3 脉冲形成电路仿真结果

Figure 3. Simulated result of pulse forming circuit

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图 4 控制系统结构图

Figure 4. Structure of control system

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图 5 高压电源电路原理

Figure 5. Schematic diagram of high voltage power supply circuit

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图 6 驱动电路原理

Figure 6. Schematic of driver circuit

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图 7 输出波形

Figure 7. Output waveforms

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参考文献(12)

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