光学设计软件X-LAB及其工程化应用

杨祖华; 周维民; 李鹏飞; 张强强; 魏来; 陈勇; 范全平; 巫殷忠; 曹磊峰

doi:10.11884/HPLPB201830.180207

光学设计软件X-LAB及其工程化应用

doi: 10.11884/HPLPB201830.180207

1.
中国工程物理研究院激光聚变研究中心, 四川绵阳 621900
2.
中国工程物理研究院计算机应用研究所, 四川绵阳 621900

基金项目:

国家重点研究发展计划项目 2017YF0503300

国家重点研究发展计划项目 2017YFA0206000

详细信息

作者简介:
杨祖华(1987—), 男, 硕士, 从事X射线诊断技术研究; yangzuhua@caep.cn

通讯作者:
曹磊峰(1967—), 男, 研究员, 博士, 主要研究方向为激光等离子体诊断; leifeng.cao@caep.cn

中图分类号: O438.2;TP391.9
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- 被引次数: 0
出版历程
- 收稿日期: 2018-07-31
- 修回日期: 2018-09-21
- 刊出日期: 2018-11-15

Optical simulation software X-LAB and its applications

1.
Research Center of Laser Fusion, CAEP, Mianyang 621900, China
2.
Institute of Computer Application, CAEP, Mianyang 621900, China

摘要

摘要: 针对自由电子激光、同步辐射光束线以及惯性约束聚变、极端条件物理过程等X射线光学系统，开发了具有独立知识产权的光学设计仿真软件X-LAB。基于光学衍射算法和序列式光线追迹算法，该软件集光线追迹仿真、矢量衍射仿真和复杂微结构特征光学元件版图绘制等功能，具有界面友好、操作便捷、包含特殊光学模块、支持“用户定制”功能等特点，为开展X射线光学系统、光学元件概念设计、优化和研制提供了不可或缺的平台。目前，X-LAB成功应用于能谱分辨率优于1000、能谱范围10~100 eV的北京同步辐射3B1无谐波单色化束线设计中及空间分辨优于6 μm，视场500 μm的惯性约束聚变物理过程X射线诊断光学系统——K-B镜系统的设计和优化中；具有复杂微结构光子筛版图绘制功能。
- X-LAB /
- X射线 /
- 光线追迹 /
- 版图绘制 /
- 矢量仿真
Abstract: To design the monochorator beamlines of synchrotron radiation, develop X-FELs and make X-ray diagnoses of inertia confinement fusion as well as simulate dynamic process in extreme physical conditions, a useful tool and a platform, X-LAB, for optical design, optimization and simulation with the independent intellectual property rights was developed. With friendly interface, X-LAB has the functions of sequence ray-tracing, vector diffraction simulation and layout drawing of complex micro-structure optical elements. Also, it is easy to operate and can provide accustomed service, characteristic functions for users to freely design, optimize an optical system. Currently, X-LAB has been applied in designs and simulations of the 3B1 monochromatic beamline in Beijing Synchrotron Radiation Facility with spectral resolution 1000 and spectral range 10~100 eV, the X-ray diagnosis optical systems of inertia confinement fusion and dynamic process in extreme physical conditions, the KB microscope with spatial resolution up to 6 μm, and the layout drawing of photon sieves.
- X-LAB /
- X-ray /
- ray-tracing /
- layout drawing /
- vector diffraction

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图 1 针孔成像系统(透射式系统)与KB成像光学系统^[12](反射式光学系统)

Figure 1. Pinhole imaging system (transmission system) and the Kirkpatrick-Baez (KB) imaging system (reflection system)

下载: 全尺寸图片幻灯片

图 2 X-LAB中光线追迹算法的基本过程和光学系统结构抽象

Figure 2. General process of sequence raytracing in X-LAB v1.5 and the structure concept of real optical system

下载: 全尺寸图片幻灯片

图 3 X-LAB的主要操作界面

Figure 3. Main interface of X-LAB

下载: 全尺寸图片幻灯片

图 4 X-LAB中KB成像：网格在像平面上所成像的散点分布及插值拟合之后光强分布

Figure 4. Imaging results in X-LAB: the scatter diagram and the intensity distribution after interpolation fitting of the grid

下载: 全尺寸图片幻灯片

图 5 3B1单色化束线主要光学系统组成成份和部分参数

Figure 5. Main components and part parameters of the 3B1 monochromatic beamline

下载: 全尺寸图片幻灯片

图 6 单色化束线仿真结果(散点分布): (a)单色器像平面处不放置狭缝，单色器像平面上的光强分布，从上至下三个光斑对应的光子能量分别为10.01, 10, 9.99 eV；(b)单色器像平面处不放置狭缝，后置聚焦像平面上光强分布；(c)单色器像平面处放置狭缝，只允许中心波长(10 eV) 的光束通过，单色器像平面上的光强分布；(d)单色器像平面处放置狭缝，只允许中心波长的光束通过，后置聚焦像平面上的光强分布

Figure 6. Simulation results of 3B1 monochromatic beamline: (a) and (b) respectively represent the scatter diagrams in the image plane of monochromator and in the image plane of the rear focusing part, without slit in the image plane of monochromator; (c) and (d) respectively represent the scatter diagrams in the image plane of monochromator and in the image plane of the rear focusing part, with a slit in the image plane of monochromator

下载: 全尺寸图片幻灯片

图 7 光子筛版图(局部截图)

Figure 7. Local drawing of layout of grating (photon sieves)

下载: 全尺寸图片幻灯片

表 1 3B1单色化束线光学系统参数设计

Table 1. Parameters of 3B1 monochromatic beamline

No.	optical element	main parameters @ 124 nm			characteristic parameters/mm	remarks
No.	optical element	object and image distance/mm	incidence and reflection angle/(°)	length and width/mm	characteristic parameters/mm	remarks
1	toroidal mirror 1	23 600, 5500	84, 84	450, 55	meridional and sagittal radius 85 344, 1468	photon sieves
2	slit 1	－	－	－	width 0.2
3	spherical mirror 1	3500, 350	84, 84	450, 60	radius 66 967
4	plane grating	450, 300	83.131 8, 72.868 2	400, 50	line spacing 300 line/mm
5	spherical mirror 2	450, 3500	84, 84	500, 60	radius 66 967
6	slit 2	－	－	－	width 0.4
7	toroidal mirror 2	1250, 1250	84, 84	500, 60	meridional and sagittal radius 11 958, 211

下载: 导出CSV

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