摆动刻蚀法制作高衍射效率凸面闪耀光栅

王琼; 沈晨; 谭鑫; 齐向东; 巴音贺希格

doi:10.11884/HPLPB201931.180298

摆动刻蚀法制作高衍射效率凸面闪耀光栅

doi: 10.11884/HPLPB201931.180298

王琼^1,,
沈晨^{2, 3},
谭鑫^2, ,,
齐向东²,
巴音贺希格²

1.
中国工程物理研究院流体物理研究所, 四川绵阳 621999
2.
中国科学院长春光学精密机械与物理研究所, 长春 130033
3.
中国科学院大学, 北京 100049

基金项目:

中国科学院重大科研装备研制项目 YZ201005

国家重大科学仪器设备开发专项 2011YQ120023

详细信息

作者简介:
王琼(1987—)，女，硕士，主要从事显微光学成像研究; estella676@sina.com

通讯作者:
谭鑫(1981—)，男，博士，研究员，博士生导师，主要从事光栅设计制作技术及光学器件微细加工技术研究; xintan_grating@163.com

中图分类号: TH744.1;O433.1
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- 被引次数: 0
出版历程
- 收稿日期: 2018-10-30
- 修回日期: 2019-03-01
- 刊出日期: 2019-07-15

Fabrication of high-efficiency convex blazed gratings by swing ion beam etching

Wang Qiong^1
,,
Shen Chen^{2, 3},
Tan Xin^{2
, ,},
Qi Xiangdong²,
Bayanheshig²

1.
Institute of Fluid Physics, CAEP, Mianyang 621999, China
2.
Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China
3.
University of Chinese Academy of Sciences, Beijing 100049, China

摘要

摘要: 通过摆动离子束刻蚀方法，制作了用于短波红外高光谱成像光谱仪的凸面闪耀光栅。该方法通过在光栅子午方向上进行摆动刻蚀，解决了凸面光栅子午方向的闪耀角一致性问题。建立了摆动刻蚀模型来分析摆动速度、束缝宽度等工艺参数对槽型演化的影响，并计算了优化的刻蚀工艺参数。制备了基底尺寸为67 mm，曲率半径为156.88 mm，刻线密度为45.5 gr/mm，闪耀角为2.2°的凸面闪耀光栅，并对其表面形貌及衍射效率进行了测量。实验结果表明，摆动刻蚀法能够制作出闪耀角一致性好、衍射效率高的小闪耀角凸面光栅，满足成像光谱仪对光谱分辨率和便携性的使用要求。
- 凸面闪耀光栅 /
- 摆动刻蚀 /
- 衍射效率 /
- 成像光谱仪
Abstract: We use the swing ion-beam etching method to fabricate short wave infrared convex blazed gratings. This method solves the consistency problem of blaze angles by swing etching through the meridian direction of the gratings. A geometric model is built to analyze the influence of swinging speed and beam slit width on groove evolution. Convex gratings with a 45.5 gr/mm groove density, 67 mm aperture, 156.88 mm radius of curvature and 2.2° blaze angle have been fabricated and measured. Experimental results validate that high-efficiency convex gratings of small blaze angle and high groove consistency can be produced by swing etching to satisfy the requirements for high spectral resolution and miniaturization of imaging spectrometers.
- convex blazed gratings /
- swing etching /
- diffraction efficiency /
- imaging spectrometer

HTML全文

图 1 理想情形下掩膜槽形轮廓演化过程

Figure 1. Groove evolution under ideal condition

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图 2 摆动刻蚀模型参数

Figure 2. Parameters of swing etching model

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图 3 束缝宽度大于临界宽度时槽形演化

Figure 3. Groove evolution when the slit width is bigger than the critical width

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图 4 样品AFM三维表面形貌图

Figure 4. 3D profile images of samples measured by AFM

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图 5 AFM横断面图与理论模型计算出的光栅槽形对比

Figure 5. Measured (solidline) and simulated (dashedline) cross-section images of grating samples

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图 6 样品的衍射效率实测结果与理论模型计算结果对比

Figure 6. Measured and calculated results of diffraction efficiency of samples

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图 7 光栅槽形的原子力测试结果

Figure 7. AFM images of the grating grooves

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图 8 样品No.5和样品No.6的实测衍射效率与曲线理想衍射效率曲线的对比

Figure 8. Comparison between measured and ideal diffraction efficiency of No.5 and No.6

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图 9 光栅表面不同位置的原子力横断面图

Figure 9. Cross-section diagrams at different locations on the grating surface by AFM

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图 10 样品No.8的实测衍射效率曲线

Figure 10. Comparison of the measured diffraction efficiency of sample No.8 with the ideal efficiency

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表 1 摆动刻蚀凸面光栅的最佳设计参数

Table 1. Designed parameters of the convex grating

aperture/mm	radius/mm	period/μm	mask height/nm	mask width/nm	duty cycle	blaze angle/(°)	roughness/nm
67	156.88	21.978	1000	5 498.8	1∶4	2.2±0.05	＜1

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表 2 摆动刻蚀工艺参数

Table 2. Swing etching parameters

ion energy/eV	beam current/mA	accelerate voltage/V	working gas ratio of Ar∶CHF₃	effective etching time/min
500	250	250	5∶3	165.88

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表 3 基底表面不同位置的闪耀角

Table 3. Blaze angles at different locations on the substrate surface

coordinate/mm	blaze angle/(°)	coordinate/mm	blaze angle/(°)	coordinate/mm	blaze angle/(°)
(a)(-30, -30)	2.158 3	(d)(0, -30)	2.207 2	(g)(30, -30)	2.172 3
(b)(-30, -0)	2.170 1	(e)(0, 0)	2.205 7	(h)(30, 0)	2.167 1
(c)(-30, 30)	2.163 1	(f)(0, 30)	2.197 6	(i)(30, 30)	2.159 6

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