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全固态高压脉冲电源在半导体光刻光源中的应用

游利兵 程超 方晓东

游利兵, 程超, 方晓东. 全固态高压脉冲电源在半导体光刻光源中的应用[J]. 强激光与粒子束, 2019, 31: 040019. doi: 10.11884/HPLPB201931.190001
引用本文: 游利兵, 程超, 方晓东. 全固态高压脉冲电源在半导体光刻光源中的应用[J]. 强激光与粒子束, 2019, 31: 040019. doi: 10.11884/HPLPB201931.190001
You Libing, Cheng Chao, Fang Xiaodong. Application of all-solid-state high-voltage pulse power supply in semiconductor lithography light source[J]. High Power Laser and Particle Beams, 2019, 31: 040019. doi: 10.11884/HPLPB201931.190001
Citation: You Libing, Cheng Chao, Fang Xiaodong. Application of all-solid-state high-voltage pulse power supply in semiconductor lithography light source[J]. High Power Laser and Particle Beams, 2019, 31: 040019. doi: 10.11884/HPLPB201931.190001

全固态高压脉冲电源在半导体光刻光源中的应用

doi: 10.11884/HPLPB201931.190001
基金项目: 

国家科技重大专项 2013ZX02202004

详细信息
    作者简介:

    游利兵(1981-),男,博士,研究员,主要从事激光技术、电源技术方面的研究;lbyou@aiofm.ac.cn

  • 中图分类号: TN86;TN248

Application of all-solid-state high-voltage pulse power supply in semiconductor lithography light source

  • 摘要: 简要回顾了半导体光刻的发展历程以及准分子激光作为光源在半导体光刻中的需求。简述了高压脉冲电源的基本原理及应用,介绍了全固态高压脉冲电源的结构和特点。着重阐述了全固态高压脉冲电源在光刻用准分子激光器和EUV光源中的应用。大功率半导体开关结合多级磁脉冲压缩开关的全固态脉冲电源有效替代传统基于闸流管的高压脉冲电源,实现了光刻光源高重复频率下的长寿命运行。介绍了中国科学院安徽光学精密机械研究所近十年来,在准分子激光器的全固态高压脉冲电源研究上的相关进展。最后,对未来半导体光刻光源对全固态脉冲电源的需求进行了展望。
  • 图  1  全固态脉冲电源示意图

    Figure  1.  Simplified circuit schematic of the all solid state pulsed power supply

    图  3  典型三级磁脉冲压缩电路中的电容电压波形

    Figure  3.  Typical capacitor voltage waveforms of a three stage magnetic pulse compression circuit

    图  4  MOPA结构示意图

    Figure  4.  Schematic diagram of the MOPA architecture(Cymer, Inc)

    图  5  MOPRA结构示意图

    Figure  5.  Schematic diagram of the MOPRA architecture (Cymer, Inc)

    图  6  Cymer公司双腔结构全固态脉冲电源系统示意图

    Figure  6.  Schematic diagram of Cymer's double-cavity all-solid-state pulse power system

    图  7  基于激光(左)或放电(右)产生锡等离子体光刻应用的EUV源

    Figure  7.  EUV sources for lithography applications based on laser- (left) or discharge-produced (right) plasmas of tin

    图  8  XTREME技术公司XTS 13-35样机

    Figure  8.  XTREME Technology Company XTS 13-35 prototype

    图  9  DPP EUV用全固态脉冲电源

    Figure  9.  All-solid-state pulse power supply for DPP EUV

    图  10  Ushio公司DPP EUV用全固态脉冲电源示意图

    Figure  10.  Schematic diagram of Ushio's all-solid-state pulse power supply for DPP EUV

    图  11  哈尔滨工业大学DPP EUV用全固态脉冲电源示意图

    Figure  11.  Schematic diagram of HIT's all-solid pulse power supply for DPP EUV

    图  12  全固态脉冲激励电路示意图

    Figure  12.  Simplified circuit schematic of SSPPM

    12  实验测得电容器电压波形

    12.  Measured voltage waveforms on capacitors

    图  13  全固态脉冲电源主回路

    Figure  13.  Simplified circuit schematic of all-solid-state pulsed power supply

    图  14  水冷循环保护系统示意图

    Figure  14.  Schematic diagram of water-cooling loop to protect system

    图  15  实验测得电容器电压波形

    Figure  15.  Measured voltage waveforms on capacitors

    图  16  双腔结构的全固态脉冲电源

    Figure  16.  All-solid-state pulse power supply with double cavity structure

    图  17  实验结果

    Figure  17.  Experimental results

    表  1  可控硅主要参数列表

    Table  1.   Parameters for silicon controlled rectifier

    VDRM /V VRRM /V IT(AV)(Ths55 ℃) /A tq(100 ℃) /μs ITSM(10 ms) /kA (dV/dt) /(V·μs-1) (di/dt) /(A·μs-1) IDRM /mA IRRM /mA
    2500 2500 2500 35~70 27 500 600 200 200
    下载: 导出CSV

    表  2  磁开关设计参数列表

    Table  2.   Design parameters for magnetic switches

    material Bs/T ΔB/T total cross section/cm2 magnetic length/cm number of turns
    first stage 1K101 1.56 2.7 11.25 20.4 26
    second stage 1K107 1.25 2.1 7.2 16.4 6
    third stage 1K107 1.25 2.1 2.4 16.4 4
    下载: 导出CSV
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出版历程
  • 收稿日期:  2019-01-01
  • 修回日期:  2019-02-20
  • 刊出日期:  2019-04-15

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