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金属表面镀高分子膜对真空击穿阈值的影响

胡祥刚 苏建仓 张瑜 朱晓欣 李小泽 谭维兵 张立刚

胡祥刚, 苏建仓, 张瑜, 等. 金属表面镀高分子膜对真空击穿阈值的影响[J]. 强激光与粒子束, 2020, 32: 075002. doi: 10.11884/HPLPB202032.190439
引用本文: 胡祥刚, 苏建仓, 张瑜, 等. 金属表面镀高分子膜对真空击穿阈值的影响[J]. 强激光与粒子束, 2020, 32: 075002. doi: 10.11884/HPLPB202032.190439
Hu Xianggang, Su Jiancang, Zhang Yu, et al. Influence of metal surface electrodeposited polymer film on threshold of vacuum breakdown[J]. High Power Laser and Particle Beams, 2020, 32: 075002. doi: 10.11884/HPLPB202032.190439
Citation: Hu Xianggang, Su Jiancang, Zhang Yu, et al. Influence of metal surface electrodeposited polymer film on threshold of vacuum breakdown[J]. High Power Laser and Particle Beams, 2020, 32: 075002. doi: 10.11884/HPLPB202032.190439

金属表面镀高分子膜对真空击穿阈值的影响

doi: 10.11884/HPLPB202032.190439
基金项目: 高功率微波技术重点实验室课题
详细信息
    作者简介:

    胡祥刚(1987—),男,硕士,助理研究员,主要从事高功率微波相关领域的研究工作;huxianggang@nint.ac.cn

  • 中图分类号: O461

Influence of metal surface electrodeposited polymer film on threshold of vacuum breakdown

  • 摘要: 探索提高金属表面真空击穿阈值的方法,对脉冲功率技术的发展和应用具有重要意义。在金属表面电子发射理论分析的基础上,采用有限元法计算阴极杆表面电场随二极管电压的变化规律,设计了实验系统,并开展了实验研究。实验对比了在脉宽约30 ns、阴极杆与阳极筒间隙12 mm时,钛合金TC4阴极杆在不同种类高分子膜(膜厚30~60 μm)下真空击穿阈值的变化情况。在表面粗糙度Rz(轮廓最大高度)为0.8 μm的TC4阴极杆表面分别镀环氧树脂膜和丙烯酸膜,实验结果表明,镀丙烯酸膜阴极杆的击穿阈值约505 kV/cm,相对于不镀膜阴极杆,击穿场强提高了约20.6%;在表面粗糙度Rz为0.2 μm的TC4阴极杆表面分别镀聚酰亚胺膜和聚醚醚酮膜,实验结果表明,镀聚酰亚胺膜阴极杆的击穿阈值为584 kV/cm,相对于不镀膜阴极杆,击穿场强提高了约28.1%。因此,在金属表面镀丙烯酸膜、聚酰亚胺膜可以有效提高金属表面的真空击穿阈值。
  • 图  1  同轴结构真空间隙模型

    Figure  1.  Vacuum gap model of coaxial structure

    图  2  阴极杆表面电子分布

    Figure  2.  Surface electron distribution of cathode rod

    图  3  实验装置结构图

    Figure  3.  Structure diagram of experimental device

    图  4  二极管电压400 kV时电场分布

    Figure  4.  Electric field distribution at diode voltage 400 kV

    图  5  阴极杆表面最大电场随二极管电压变化规律

    Figure  5.  Maximum electric field on the cathode rod surface varies with the diode voltage

    图  6  阴极杆镀环氧树脂膜

    Figure  6.  Cathode rod with epoxy coating

    图  7  实验装置

    Figure  7.  Experimental device

    图  8  击穿前电压电流波形

    Figure  8.  Voltage and current waveforms before breakdown

    图  9  击穿后电压电流波形

    Figure  9.  Breakdown voltage and current waveforms

    图  10  阴极杆镀ER膜和AC膜的EsEbi

    Figure  10.  Es and Ebi of cathode rod (Rz=0.8 µm) with ER film and AC film

    图  11  阴极杆镀PI膜和PEEK膜的EsEbi

    Figure  11.  Es and Ebi of cathode rod (Rz=0.2 µm) with PI film and PEEK film

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出版历程
  • 收稿日期:  2019-11-28
  • 修回日期:  2020-04-20
  • 刊出日期:  2020-06-24

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