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等离子体结合六甲基二硅胺烷处理提升增透膜抗真空污染性能研究

董祥 吕海兵 严鸿维 黎波 向霞 蒋晓东

董祥, 吕海兵, 严鸿维, 等. 等离子体结合六甲基二硅胺烷处理提升增透膜抗真空污染性能研究[J]. 强激光与粒子束, 2021, 33: 071002. doi: 10.11884/HPLPB202133.200341
引用本文: 董祥, 吕海兵, 严鸿维, 等. 等离子体结合六甲基二硅胺烷处理提升增透膜抗真空污染性能研究[J]. 强激光与粒子束, 2021, 33: 071002. doi: 10.11884/HPLPB202133.200341
Dong Xiang, Lü Haibing, Yan Hongwei, et al. Plasma combined with hexamethyldisilazane treatment to improve anti-vacuum pollution performance of antireflective coatings[J]. High Power Laser and Particle Beams, 2021, 33: 071002. doi: 10.11884/HPLPB202133.200341
Citation: Dong Xiang, Lü Haibing, Yan Hongwei, et al. Plasma combined with hexamethyldisilazane treatment to improve anti-vacuum pollution performance of antireflective coatings[J]. High Power Laser and Particle Beams, 2021, 33: 071002. doi: 10.11884/HPLPB202133.200341

等离子体结合六甲基二硅胺烷处理提升增透膜抗真空污染性能研究

doi: 10.11884/HPLPB202133.200341
详细信息
    作者简介:

    董 祥(1996—),男,硕士研究生,从事纳米二氧化硅增透膜研究

    通讯作者:

    向 霞(1974—),女,教授,从事强激光和材料相互作用研究

  • 中图分类号: O484

Plasma combined with hexamethyldisilazane treatment to improve anti-vacuum pollution performance of antireflective coatings

  • 摘要: 本文采用溶胶-凝胶法制备了SiO2增透膜,然后对其进行等离子体结合六甲基二硅胺烷(HMDS)表面改性处理。研究了后处理改性对增透膜表面形貌、微观结构、光学性能及激光损伤性能的影响规律,获得了抗真空有机污染的二氧化硅增透膜。结果表明,增透膜在采用等离子体结合HMDS表面改性处理后,膜层收缩、粗糙度下降、极性羟基等有机基团含量减少;两步后处理改善了增透膜膜层结构和光学性能,显著提高了膜层疏水能力和真空条件下的抗污染性能,并且对溶胶-凝胶二氧化硅增透膜的高损伤阈值属性不产生影响。
  • 图  1  等离子体处理前后化学膜的傅里叶变换红外光谱

    Figure  1.  FTIR spectra of sol-gel films before and after plasma treatment

    图  2  化学膜S2的扫描探针显微镜三维图像

    Figure  2.  Three dimensional images of sol-gell film S2 obtained by scanning probe microscope

    图  3  化学膜S2经等离子体和HMDS处理前后的亲/疏水变化

    Figure  3.  Water contact angle of sol-gel film S2

    图  4  化学膜两步处理前后透射性能变化

    Figure  4.  Transmission spectra of sol-gel film before and after two-step treatment

    图  5  S0,S2真空污染实验前后透过率变化

    Figure  5.  Transmission spectra of of S0 and S2 before and after vacuum pollution

    图  6  S00,S1,S3真空污染实验前后透过率变化

    Figure  6.  Transmission spectra of S00, S1 and S3 before and after vacuum pollution

    表  1  化学膜S2、S3膜厚和折射率变化

    Table  1.   Changes of thickness and refractive index of sol-gel films S2 and S3

    samplethickness/nmrefractive index
    before treatmentplasmatreated HMDSbefore treatmentplasmatreated HMDS
    S2 90.03 71.98 72.58 1.2113 1.1914 1.2207
    S3 84.67 65.98 66.03 1.2022 1.1977 1.2232
    下载: 导出CSV
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出版历程
  • 收稿日期:  2020-12-17
  • 修回日期:  2021-05-01
  • 网络出版日期:  2021-05-28
  • 刊出日期:  2021-07-15

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