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MW级中性束注入弧电源系统优化

张锦涛 阳璞琼 魏会领 余珮炫 罗怀宇 耿少飞 周博文 万银祥 曹建勇

张锦涛, 阳璞琼, 魏会领, 等. MW级中性束注入弧电源系统优化[J]. 强激光与粒子束, 2021, 33: 085002. doi: 10.11884/HPLPB202133.210026
引用本文: 张锦涛, 阳璞琼, 魏会领, 等. MW级中性束注入弧电源系统优化[J]. 强激光与粒子束, 2021, 33: 085002. doi: 10.11884/HPLPB202133.210026
Zhang Jintao, Yang Puqiong, Wei Huiling, et al. Research on optimization of MW level neutral beam injection arc power supply system[J]. High Power Laser and Particle Beams, 2021, 33: 085002. doi: 10.11884/HPLPB202133.210026
Citation: Zhang Jintao, Yang Puqiong, Wei Huiling, et al. Research on optimization of MW level neutral beam injection arc power supply system[J]. High Power Laser and Particle Beams, 2021, 33: 085002. doi: 10.11884/HPLPB202133.210026

MW级中性束注入弧电源系统优化

doi: 10.11884/HPLPB202133.210026
基金项目: 国家自然科学基金项目(11675074);衡阳市科技计划项目(202002042159);湖南省国际科技合作基地项目(2018WK4009)
详细信息
    作者简介:

    张锦涛(1996—),男,硕士,从事电力电子技术,大功率中性束注入电源研究

    通讯作者:

    阳璞琼(1980—),男,博士,副教授,从事电力电子技术,核能科学与工程研究

  • 中图分类号: TL629

Research on optimization of MW level neutral beam injection arc power supply system

  • 摘要: 中性束注入弧电源的性能严重影响弧放电的稳定性和中性束加热的效率。HL-2A装置弧电源采用基于晶闸管相控调压和12脉波不控整流的线性电源技术;HL-2M测试束线弧电源采用基于超级电容和IGBT全控整流的开关电源技术。为了优化电源系统性能、改进弧放电稳定性,研究了采样频率对弧放电稳定性的影响。通过对两套电源控制系统进行建模,利用MATLAB仿真了不同采样频率下HL-2M弧流电源控制系统的阶跃响应性能和HL-2A的控制系统性能,分析了采样频率对系统性能的影响。利用离子源测试平台进行不同采样频率下的弧放电实验对仿真结果进行验证,实验结果与仿真结果一致。实验结果验证:采样频率对弧放电稳定性有很大影响,在频率可调范围内,增大采样频率,可以提高控制系统性能,优化弧放电稳定性;HL-2A弧放电不稳定的原因是晶闸管导通特性和滤波电路引起的。
  • 图  1  HL-2A装置NBI弧电源主电路图

    Figure  1.  Main circuit diagram of NBI arc power supply of HL-2A

    图  2  HL-2M装置NBI弧电源主电路图

    Figure  2.  Main circuit diagram of NBI arc power supply of HL-2M

    图  3  HL-2M装置NBI弧电源控制系统框图

    Figure  3.  Block diagram of NBI arc power supply control system of HL-2M

    图  4  HL-2A装置NBI弧电源控制系统框图

    Figure  4.  Block diagram of NBI arc power supply control system of HL-2A

    图  5  HL-2M和HL-2A弧电源阶跃响应图

    Figure  5.  Step response diagram of HL-2M and HL-2A arc power supply

    图  6  采样频率为10 kHz和300 Hz弧电源阶跃响应图

    Figure  6.  Step response diagram of 10 kHz and 300 Hz arc power supply

    图  7  300 Hz频率下弧流输出波形及其局部放大

    Figure  7.  Arc current output waveform and its partial amplification at 300 Hz

    图  8  10 kHz频率下弧流输出波形及其局部放大

    Figure  8.  Arc current output waveform and its partial amplification at 10 kHz

    图  9  100 kHz频率下弧流输出波形及其局部放大

    Figure  9.  Arc current output waveform and its partial amplification at 100 kHz

    图  10  HL-2A弧放电波形和HL-2M在300 Hz频率下的弧放电波形

    Figure  10.  HL-2A arc discharge waveform and HL-2M arc discharge waveform at 300 Hz frequency

    表  1  不同频率下弧电源各项参数对比

    Table  1.   Comparison of various parameters of arc power supply at different frequencies

    sampling frequency/kHzactual holing time/msrise time/msadjust time/mscurrent overshoot/Acurrent ripple/A
    0.311.96.914.759.746.8
    106.21.36.160.829.2
    1005.40.251.052.829.5
    下载: 导出CSV
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出版历程
  • 收稿日期:  2021-01-21
  • 修回日期:  2021-06-15
  • 网络出版日期:  2021-07-21
  • 刊出日期:  2021-08-15

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