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环氧树脂的等离子体表面梯度刻蚀及沿面闪络性能研究

闫纪源 梁贵书 康玉婵 彭程凯 万子剑 吕天舒 谢庆

闫纪源, 梁贵书, 康玉婵, 等. 环氧树脂的等离子体表面梯度刻蚀及沿面闪络性能研究[J]. 强激光与粒子束, 2021, 33: 065016. doi: 10.11884/HPLPB202133.210100
引用本文: 闫纪源, 梁贵书, 康玉婵, 等. 环氧树脂的等离子体表面梯度刻蚀及沿面闪络性能研究[J]. 强激光与粒子束, 2021, 33: 065016. doi: 10.11884/HPLPB202133.210100
Yan Jiyuan, Liang Guishu, Kang Yuchan, et al. Effect of plasma surface gradient etching on surface flashover performance of epoxy resin[J]. High Power Laser and Particle Beams, 2021, 33: 065016. doi: 10.11884/HPLPB202133.210100
Citation: Yan Jiyuan, Liang Guishu, Kang Yuchan, et al. Effect of plasma surface gradient etching on surface flashover performance of epoxy resin[J]. High Power Laser and Particle Beams, 2021, 33: 065016. doi: 10.11884/HPLPB202133.210100

环氧树脂的等离子体表面梯度刻蚀及沿面闪络性能研究

doi: 10.11884/HPLPB202133.210100
基金项目: 国家自然科学基金项目(51777076);中央高校基本科研业务费专项资金项目(2019MS083);新能源电力系统国家重点实验室自主研究课题(LAPS2019-21)
详细信息
    作者简介:

    闫纪源(1995—),男,博士研究生,从事等离子体、高电压与绝缘技术相关研究

    通讯作者:

    谢 庆(1979—),男,教授,博士,从事等离子体、高电压与绝缘技术相关研究

  • 中图分类号: O53

Effect of plasma surface gradient etching on surface flashover performance of epoxy resin

  • 摘要: 结合等离子体表面刻蚀方法与梯度改性方法,实现了氧化铝/环氧树脂表面的等离子体梯度刻蚀。利用扫描电子显微镜(SEM)、表面轮廓仪、X射线光电子能谱分析(XPS)、高阻计、闪络电压和表面电位测试系统,对比了未处理、等离子体均匀刻蚀、等离子体梯度刻蚀三种情况的样片表面形貌、化学元素和电气参数,研究了等离子体梯度刻蚀对沿面闪络性能的提升机理。结果表明,等离子体表面刻蚀可提升环氧树脂表面粗糙度、提高样片表面电导率、浅化陷阱能级以及提升沿面闪络电压。等离子体梯度刻蚀对闪络电压的提升效果要优于等离子体均匀刻蚀,相比于未处理样片最大可提升26.5%。分析认为针-针电极的电场分布可划分为三结合点处附近的高场强区和电极之间的低场强区,加快高场强区的表面电荷消散速率并适当控制低场强区表面电荷迁移速率,可以最大程度地提升样片整体的沿面闪络性能。
  • 图  1  氧化铝/环氧树脂样片制备流程图

    Figure  1.  Preparation process of the Al2O3-filled epoxy resin sample

    图  2  等离子体刻蚀平台示意图

    Figure  2.  Schematic diagram of the plasma etching platform

    图  3  样片表面分区示意图

    Figure  3.  Schematic diagram of the sample surface partition

    图  4  环氧树脂沿面闪络测试平台

    Figure  4.  The surface flashover test platform for epoxy resin

    图  5  环氧树脂表面电位衰减测试平台

    Figure  5.  The surface potential decay test platform for epoxy resin

    图  6  等离子体刻蚀前后样片表面SEM图

    Figure  6.  SEM images of sample surface before and after plasma etching

    图  7  等离子体刻蚀前后样片表面粗糙度

    Figure  7.  Sample surface roughness before and after plasma etching

    图  8  所有样片的XPS谱图

    Figure  8.  XPS spectra of all samples

    图  9  所有样片C1s峰分峰处理

    Figure  9.  C1s peak-fitting of all samples

    图  10  改性前后样片的沿面闪络电压测量结果

    Figure  10.  Sample surface flashover voltages before and after treatment

    图  11  改性前后样片表面电导率测量结果

    Figure  11.  Sample surface conductivities before and after treatment

    图  12  等离子体刻蚀前后样片表面电位消散曲线

    Figure  12.  Sample surface potential decay curves before and after plasma etching

    图  13  等离子体刻蚀前后样片表面陷阱能级分布

    Figure  13.  Trap energy level distribution of sample surfaces before and after plasma etching

    表  1  等离子体刻蚀前后表面元素含量变化

    Table  1.   Surface elements changes before and after plasma etching (%)

    sampleratio
    COAlSi
    UT74.4211.280.8913.41
    E562.6619.433.2614.65
    E1053.4124.218.4613.92
    下载: 导出CSV
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出版历程
  • 收稿日期:  2021-03-22
  • 修回日期:  2021-04-21
  • 网络出版日期:  2021-05-08
  • 刊出日期:  2021-06-15

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