Relationship between the geometric characteristics of the polished area and the key parameters of the flow field creation
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摘要: 磁流变抛光在其实际工作过程中，抛光区域几何特征的不同将会对流场创成的关键参数产生很大的影响。针对此问题建立三维模型与实验仿真展开研究。在研究抛光区域几何特征与流场创成关键参数的关系时，先改变抛光区域形状，观察其对流场创成中剪切应力、压力产生的影响；再控制抛光区域的形状相同时，通过改变抛光区域尺寸大小，观察对流场创成中剪切应力、压力产生的影响。结果表明：当抛光区域形状不同时，抛光区域为凹面时剪切应力最大，抛光区域为凸面时剪切应力最小。当抛光区域形状为凸面时，抛光区域两边的剪切应力随着抛光区域曲率大小增大而增大；当抛光区域形状为凹面，抛光区域两边的剪切应力随着抛光区域曲率大小增大而减小。当抛光区域形状不同时，抛光区域为凹面时压力最大，抛光区域为凸面时压力最小。当抛光区域形状为凸面时，抛光区域处的压力随着抛光区域曲率增大而增大；当抛光区域形状为凹面时，抛光区域处的压力随着抛光区域曲率增大而减小。Abstract: In the actual working process of magnetorheological polishing, the difference of the geometric characteristics of the polished area will have a great influence on the key parameters of the flow field creation. However, there is still a lack of research in this area, so this article establishes a three-dimensional model and experimental simulation for this problem. In studying the relationship between the geometric characteristics of the polished area and the key parameters of the flow field creation, first change the shape of the polished area to observe its influence on the shear stress and pressure in the flow field creation; when the shape of the polished area is the same, change the size of the polished area and observe its effect on the shear stress and pressure in the creation of the flow field. It is found that when the shape of the polished area differs, the shear stress is the largest when the polishing area is concave, while it is the smallest when the polished area is convex. When the polished area is convex, the shear stress on both sides of the polished area increases as the curvature of the polished area increases; when the polished area is concave, the shear stress on both sides of the polished area increases as the curvature of the polished area increases. When the shape of the polished area is different, the pressure is maximum when the polished area is concave, and the pressure is minimum when the polished area is convex. When the shape of the polished area is convex, the pressure at the polished area increases as the curvature of the polished area increases; when the shape of the polished area is concave, the pressure at the polished area decreases as the curvature of the polished area increases.
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图 2 抛光区域为凹面，凸面、平面时的剪切应力云图
Figure 2. Shear stress cloud diagram when the polished area is concave, convex and flat
图 3 抛光区域x轴上剪切应力分布曲线图
Figure 3. Shear stress distribution curve on the x-axis of the polished area
图 4 抛光区域为凸面时曲率大小为80 mm至440 mm的剪切应力云图
Figure 4. Shear stress cloud diagram with curvature of 80 mm to 440 mm when the polished area is convex
图 5 凸面抛光区域x轴上剪切应力分布曲线图
Figure 5. Shear stress distribution curve on the x-axis of the convex polished area
图 6 抛光区域为凹面时曲率大小为180 mm至450 mm的剪切应力云图
Figure 6. Shear stress cloud diagram with a curvature of 180 mm to 450 mm when the polished area is concave
图 7 凹面抛光区域x轴上剪切应力分布曲线图
Figure 7. Shear stress distribution curve on the x-axis of the concave polished area
图 8 抛光区域为凹面、凸面、平面的压力云图
Figure 8. Pressure cloud diagram of the concave, convex, and flat polished area
图 9 抛光区域x轴上压力分布曲线图
Figure 9. Pressure distribution curve on the x-axis of the polished area
图 10 抛光区域为凸面时曲率大小80 mm至440 mm的压力云图
Figure 10. Pressure cloud diagram with a curvature of 80 mm to 440 mm when the polished area is convex
图 11 凸面抛光区域x轴上压力分布曲线图
Figure 11. Pressure distribution curve on the x-axis of the convex polished area
图 12 抛光区域为凹面时曲率大小180 mm至450 mm压力云图
Figure 12. Pressure cloud diagram with curvature of 180 mm to 450 mm when the polished area is concave
图 13 凹面抛光区域x轴上压力分布曲线图
Figure 13. Pressure distribution curve on the x-axis of the concave polished area
表 1 选用的磁流变抛光工艺参数
Table 1. Selected magnetorheological polishing process parameters
consistency index,
k/(sn−2/m)power law
indexyield stress
threshold ptemporary shear
rate/(1/s)flow coefficient
nribbon
thickness/mmribbon
width/mmpolishing wheel
speed v/(m/s)inlet and outlet
pressure/Pa59.01 0.7301 13861.84 100 0.3755 1.5 15 4.71 101000 
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表 2 不同形状抛光区域
Table 2. Polished areas of different shapes
No. immersion depth h/mm shape 1 1.0 concave 2 1.0 convex 3 1.0 plane
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表 3 选取的抛光区域曲率大小参数
Table 3. Curvature parameters of the selected polishing area
No. immersion
depth h/mmconvex
curvature r/mmconcave
curvature r/mm1 1.0 80 180 2 1.0 120 210 3 1.0 160 240 4 1.0 200 270 5 1.0 240 300 6 1.0 280 330 7 1.0 320 360 8 1.0 360 390 9 1.0 400 420 10 1.0 440 450
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表 4 不同形状抛光区域
Table 4. Polished areas of different shapes
No. immersion depth h/mm shape 1 1.0 concave 2 1.0 convex 3 1.0 plane
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表 5 选取的抛光区域曲率大小参数
Table 5. Curvature parameters of the selected polishing area
No. immersion
depth h/mmconvex
curvature r/mmconcave
curvature r/mm1 1.0 80 180 2 1.0 120 210 3 1.0 160 240 4 1.0 200 270 5 1.0 240 300 6 1.0 280 330 7 1.0 320 360 8 1.0 360 390 9 1.0 400 420 10 1.0 440 450
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[1] Awwal A, Bowers M, Wisoff J, et al. Status of NIF laser and high power laser research at LLNL[C]//SPIE Lase. 2017: 1008403. [2] 高伟, 魏齐龙, 李晓媛, 等. 磁流变抛光与磁流变液: 原理与研究现状[J]. 磁性材料及器件, 2015, 46(2):68-73. (Gao Wei, Wei Qilong, Li Xiaoyuan, et al. Magnetorheological polishing and magnetorheological fluids: principles and research status[J]. Magnetic Materials and Devices, 2015, 46(2): 68-73 doi: 10.3969/j.issn.1001-3830.2015.02.016 [3] Yin Yuehong, Zhang Yifan, Dai Yifan, et al. Novel magneto-rheological finishing process of KDP crystal by controlling fluid-crystal temperature difference to restrain deliquescence[J]. CIRP Annals, 2018, 67(1): 587-590. doi: 10.1016/j.cirp.2018.04.058 [4] Jain V K, Ranjan P, Suri V K, et al. Chemo-mechanical magneto-rheological finishing (CMMRF) of silicon for microelectronics applications[J]. CIRP Annals, 2010, 59(1): 323-328. doi: 10.1016/j.cirp.2010.03.106 [5] Khan D A, Alam Z, Jha S. Nanofinishing of copper using ball end magnetorheological finishing (BEMRF) process[C]//ASME International Mechanical Engineering Congress and Exposition. 2016. [6] 张峰, 余景池, 张学军, 等. 磁流变抛光技术[J]. 光学精密工程, 1999, 7(5):1-8. (Zhang Feng, Yu Jingchi, Zhang Xuejun, et al. Magnetorheological polishing technology[J]. Optics and Precision Engineering, 1999, 7(5): 1-8 doi: 10.3321/j.issn:1004-924X.1999.05.001 [7] 杨建国, 李中会, 李蓓智, 等. 精密磁流变抛光装置的设计与应用[J]. 机械设计与制造, 2010, 2010(9):60-62. (Yang Jianguo, Li Zhonghui, Li Beizhi, et al. Design and application of precision magnetorheological polishing device[J]. Machine Design and Manufacturing, 2010, 2010(9): 60-62 doi: 10.3969/j.issn.1001-3997.2010.09.026 [8] 成连民, 李蓓智, 杨建国, 等. 磁流变抛光工艺参数的研究[J]. 机械, 2009, 36(6):11-16. (Cheng Lianmin, Li Beizhi, Yang Jianguo, et al. Research on the process parameters of magnetorheological polishing[J]. Machinery, 2009, 36(6): 11-16 [9] 甄宗坤, 蔡东健. 基于面状几何基元的特征自动提取技术[J]. 水利与建筑工程学报, 2018, 16(2):147-151. (Zhen Zongkun, Cai Dongjian. Automatic feature extraction technology based on planar geometric primitives[J]. Journal of Water Resources and Architectural Engineering, 2018, 16(2): 147-151 doi: 10.3969/j.issn.1672-1144.2018.02.028 [10] 张云, 冯之敬, 赵广木. 磁流变抛光工具及其去除函数[J]. 清华大学学报(自然科学版), 2004, 2004(2):190-193. (Zhang Yun, Feng Zhijing, Zhao Guangmu. Magnetorheological polishing tool and its removal function[J]. Journal of Tsinghua University (Natural Science Edition), 2004, 2004(2): 190-193 doi: 10.3321/j.issn:1000-0054.2004.02.015 [11] 石峰, 戴一帆, 彭小强, 等. 磁流变抛光过程的材料去除三维模型[J]. 中国机械工程, 2009, 20(6):644-648. (Shi Feng, Dai Yifan, Peng Xiaoqiang, et al. Three-dimensional model of material removal in magnetorheological polishing process[J]. China Mechanical Engineering, 2009, 20(6): 644-648 doi: 10.3321/j.issn:1004-132X.2009.06.004 [12] Liu Jiabao, Li Xiaoyuan, Zhang Yunfei, et al. Predicting the material removal rate (MRR) in surface magnetorheological finishing (MRF) based on the synergistic effect of pressure and shear stress[J]. Applied Surface Science, 2020, 504: 144492. doi: 10.1016/j.apsusc.2019.144492 [13] Chen Mingjun, Liu Henan, Cheng Jian, et al. Model of the material removal function and an experimental study on a magnetorheological finishing process using a small ball-end permanent-magnet polishing head[J]. Applied Optics, 2017, 56(19): 5573-5582. doi: 10.1364/AO.56.005573 [14] 李耀明, 沈兴全, 王爱玲. 磁流变抛光技术的工艺试验[J]. 金刚石与磨料磨具工程, 2009, 2009(5):64-66. (Li Yaoming, Shen Xingquan, Wang Ailing. Process test of magnetorheological polishing technology[J]. Diamond and Abrasive Engineering, 2009, 2009(5): 64-66 doi: 10.3969/j.issn.1006-852X.2009.05.013 [15] 秦北志, 杨李茗, 朱日宏, 等. 光学元件精密加工中的磁流变抛光技术工艺参数[J]. 强激光与粒子束, 2013, 25(9):2281-2286. (Qin Beizhi, Yang Liming, Zhu Rihong, et al. Process parameters of magnetorheological polishing technology in precision machining of optical components[J]. High Power Laser and Particle Beam, 2013, 25(9): 2281-2286 doi: 10.3788/HPLPB20132509.2281 [16] 李发胜, 张平. 抛光用磁流变液的研究[J]. 功能材料, 2006(8):1187-1190. (Li Fasheng, Zhang Ping. Research on magnetorheological fluid for polishing[J]. Functional Materials, 2006(8): 1187-1190 doi: 10.3321/j.issn:1001-9731.2006.08.001 [17] 沙树静, 胡锦飞, 张和权. 磁流变抛光技术发展[J]. 机械工程师, 2018, 2018(7):5-8. (Sha Shujing, Hu Jinfei, Zhang Hequan. Development of magnetorheological polishing technology[J]. Mechanical Engineer, 2018, 2018(7): 5-8 doi: 10.3969/j.issn.1002-2333.2018.07.002 -
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