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原子力显微镜加工轨迹测压电剪切叠堆二维高频运动位移

尹若楠 薛勃 张津铭 吴哲

尹若楠, 薛勃, 张津铭, 等. 原子力显微镜加工轨迹测压电剪切叠堆二维高频运动位移[J]. 强激光与粒子束, 2024, 36: 089003. doi: 10.11884/HPLPB202436.230351
引用本文: 尹若楠, 薛勃, 张津铭, 等. 原子力显微镜加工轨迹测压电剪切叠堆二维高频运动位移[J]. 强激光与粒子束, 2024, 36: 089003. doi: 10.11884/HPLPB202436.230351
Yin Ruonan, Xue Bo, Zhang Jinming, et al. Measurement of two-dimensional high-frequency motion displacement of piezoelectric shear stack using atomic force microscope tapping trajectories[J]. High Power Laser and Particle Beams, 2024, 36: 089003. doi: 10.11884/HPLPB202436.230351
Citation: Yin Ruonan, Xue Bo, Zhang Jinming, et al. Measurement of two-dimensional high-frequency motion displacement of piezoelectric shear stack using atomic force microscope tapping trajectories[J]. High Power Laser and Particle Beams, 2024, 36: 089003. doi: 10.11884/HPLPB202436.230351

原子力显微镜加工轨迹测压电剪切叠堆二维高频运动位移

doi: 10.11884/HPLPB202436.230351
基金项目: 国家自然科学基金项目(52105434);中国博士后科学基金项目(2022M710642);东北林业大学人才引进计划项目(520/60201487)
详细信息
    作者简介:

    尹若楠,yinruonan1@163.com

    通讯作者:

    薛 勃,xuebo@nefu.edu.cn

  • 中图分类号: TN384

Measurement of two-dimensional high-frequency motion displacement of piezoelectric shear stack using atomic force microscope tapping trajectories

  • 摘要: 针对两轴压电剪切叠堆在高频电压驱动下的二维高频运动的位移测量问题,提出使用(AFM)探针在敲击模式下的加工痕迹测量压电剪切叠堆运动位移的方法,首先制备热塑性聚合物聚甲基丙烯酸甲酯(PMMA)薄膜,随后进行AFM探针敲击加工实验,扫描AMF探针加工轨迹并对其进行后处理,成功得到压电剪切叠堆的二维高频运动位移,实现了以半接触的方式对压电剪切叠堆二维高频复杂运动的准确检测,并依据实验数据对压电剪切叠堆二维运动位移随电压幅值及频率的变化情况进行分析。实验结果表明,在10 Hz~5 kHz的激励信号频率范围内,所提出的方法能准确测量压电剪切叠堆的运动位移。
  • 图  1  压电剪切叠堆驱动的实验装置示意图

    Figure  1.  Schematic diagram of the experimental device driven by piezoelectric shear stack

    图  2  AFM扫描敲击加工纳米沟槽二维、三维形貌及其横截面

    Figure  2.  Two-dimensional, three-dimensional morphology and cross section of nanogrooves processed by AFM scanning tapping

    图  3  0.4 V/0.4 V,0.6 V/0.6 V,0.8 V/0.8 V,100 Hz/500 Hz/1500 Hz下纳米沟槽三维形貌图

    Figure  3.  Three-dimensional topography of nanogrooves at 0.4 V/0.4 V, 0.6 V/0.6 V, 0.8 V/0.8 V, 100 Hz/500 Hz /1 500 Hz

    图  4  后处理流程图

    Figure  4.  Post-processing flowchart

    图  5  0.4 V/0.4 V, 0.6 V/0.6 V, 0.8 V/0.8 V, 100 Hz/500 Hz/1 500 Hz情况下轨迹投影及其拟合圆周

    Figure  5.  Trajectory projection and its fitting circle under the condition of 0.4 V/0.4 V, 0.6 V/0.6 V, 0.8 V/0.8 V, 100 Hz/500 Hz/1 500 Hz

    图  6  0.4 V/0.8V, 10 Hz/200 Hz/600 Hz/1 000 Hz下轨迹投影及其拟合圆周

    Figure  6.  Trajectory projection and its fitting circle under 0.4 V/0.8V, 10 Hz/200 Hz/600 Hz/1 000 Hz

    图  7  轨迹半径随电压及频率的变化情况

    Figure  7.  Change of trajectory radius with voltage and frequency

    图  8  轨迹半径在高频率下的变化情况及高频率情况下的轨迹形貌

    Figure  8.  Change of trajectory radius at high frequency and the trajectory morphology at high frequency

    表  1  驱动电压信号数值

    Table  1.   Driving voltage signal parameters

    voltage/V frequency/Hz
    0.4/0.4, 0.6/0.6, 0.8/0.8 10, 100, 200, 500, 800, 1000, 1500, 2000
    0.4/0.8 10, 100, 200, 500, 800, 1000
    0.4/0.4 2500, 3000, 3500, 4000, 4500, 5000, 5500, 6000, 6500, 7000, 7500, 8000
    下载: 导出CSV
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出版历程
  • 收稿日期:  2023-10-23
  • 修回日期:  2024-05-21
  • 录用日期:  2024-12-03
  • 网络出版日期:  2024-05-29
  • 刊出日期:  2024-07-04

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