Fabrication technology of Al/Ta-Nb alloy impedance match target
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摘要: 为了获得钽铌合金（Ta-Nb）材料在高压下的状态方程数据，制备了用于激光状态方程实验研究的铝/钽铌合金（Al/Ta-Nb）阻抗匹配靶。研究了Ta-Nb合金箔的精密轧制与飞秒激光切割工艺，获得了厚度13 μm，宽度400 μm的Ta-Nb合金台阶样品。使用聚乙烯醇（PVA）水溶胶将Ta-Nb合金台阶与Al标准材料进行复合装配。利用白光干涉仪、电子密度计等仪器对阻抗匹配靶的表面形貌、台阶厚度、样品密度等靶参数进行精密测量，结果表明研制的Al/Ta-Nb合金阻抗匹配靶能够满足激光状态方程物理实验需求。Abstract: In order to obtain the equation of state (EOS) of tantalum-niobium alloy (Ta-Nb) materials under high pressure, the fabrication process of Al/Ta-Nb impedance match target for laser EOS experiments was presented. The processes of precision rolling and femtosecond laser cutting of Ta-Nb alloy foil were studied. A step sample of Ta-Nb alloy with a thickness of 13 μm and a width of 400 μm was obtained. Ta-Nb alloy step was assembled with Al standard material using polyvinyl alcohol (PVA) hydrosol. The surface morphology, step thickness and sample density of the target were measured by white light interferometer and electronic densitometer. The results show that the Al/Ta-Nb alloy impedance match target fabricated can meet the requirements of laser EOS experiments.
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Key words:
- Ta-Nb alloy /
- impedance match target /
- equation of state /
- precision rolling /
- femtosecond laser
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图 1 Al/Ta-Nb合金阻抗匹配靶结构示意图。VISAR表示任意反射面速度干涉仪，烧蚀层为12 μm厚度的聚苯乙烯，预热屏蔽层为25 μm厚度的溴代聚苯乙烯，基底材料为35±2 μm厚度的Al，标准台阶材料为20±1 μm厚度的Al，待测样品台阶为13±2 μm厚度的Ta-Nb。
Figure 1. Schematic configuration of the Al/Ta-Nb alloy impedance match target. VISAR represents the arbitrary reflector velocity interferometer, the ablative layer is polystyrene with a thickness of 12 microns, the preheating shield layer is bromine polystyrene with a thickness of 25 microns, the base material is Al with a thickness of 35±2 microns, and the standard step material is Al with a thickness of 20±1 microns. The step of the sample to be measured is Ta-Nb with a thickness of 13±2 microns
图 2 飞秒激光烧蚀加工系统示意图和实物图
Figure 2. Experimental setup and device of femtosecond laser ablation
图 3 Al/Ta-Nb合金阻抗匹配靶显微镜图片
Figure 3. Microscopic image of Al/Ta-Nb alloy impedance match target
图 6 Al/Ta-Nb阻抗匹配靶白光干涉仪测试图像
Figure 6. White light interferometer image of of Al/Ta-Nb alloy impedance match target
表 1 Al/Ta-Nb阻抗匹配靶参数测试值与要求值的对比
Table 1. Comparison of required and measured values of Al/Ta-Nb impedance match target
thickness of Al step/μm thickness of Ta-Nb step/μm gap width/μm Rq of Al/nm Rq of Ta-Nb/nm required value 20±1 13±2 ＜120 ＜50 ＜50 measured value 20.00 13.00 90.10 33.83 48.65 
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