极紫外多层膜氮化物和氧化物保护层的工艺研究

王佳兴; 韩伟明; 张晗; 匡尚奇

doi:10.11884/HPLPB202537.240216

极紫外多层膜氮化物和氧化物保护层的工艺研究

doi: 10.11884/HPLPB202537.240216

长春理工大学物理学院，长春 130022

基金项目: 国家自然基金委区域联合基金重点项目（U22A2070）

详细信息

作者简介:
王佳兴，jxwang20007@163.com

通讯作者:
匡尚奇，ksq@cust.edu.cn。

中图分类号: ;O484.5
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- 文章访问数: 67
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- PDF下载量: 5
- 被引次数: 0
出版历程
- 收稿日期: 2024-06-28
- 修回日期: 2024-11-08
- 录用日期: 2024-08-28
- 网络出版日期: 2024-11-20

Protective layer of oxides and nitrides on the surface of extreme ultraviolet multilayers

Department of Physics, Changchun University of Science and Technology, Changchun 130000, China

摘要

摘要: 极紫外（EUV）反射镜在高能、高功率极紫外光辐照的过程中，其表面易形成碳沉积和氧化，从而影响其反射率，进而缩短其使用寿命。针对这一问题，分别实验研究了在极紫外多层膜表面镀制氮化物和氧化物保护层的制备工艺，并进行了表征。在制备过程中，基于直流反应磁控溅射技术，研究了工艺气体流量与溅射电压之间的“双曲线”关系，以此优化控制反应气体量，进而降低反应溅射过程中反应气体对Mo/Si多层膜的影响。基于这一方法，分别在Mo/Si多层膜表面镀制TiN、ZrN和TiO₂保护层，应用掠入射X射线反射（GIXR）、X射线光电子能谱（XPS）和透射电子显微成像（TEM）对其进行了表征，并通过对比分析，验证了氮化物保护层具有一定的性能优势。
- 极紫外多层膜 /
- 反应磁控溅射 /
- 表面保护层 /
- 氮化物/氧化物薄膜
Abstract: In the process of high energy and high power extreme ultraviolet (EUV) irradiation, carbon deposition and surface oxidation are easy to form on the surface of the EUV mirror, which will affect its reflectivity and shorten its service life. To solve this problem, technology of nitride and oxide capping coating on the surface of extreme ultraviolet multilayer film was studied experimentally and characterized. In the preparation process, based on DC reactive magnetron sputtering coating technology, the "hyperbola" relationship between process gas flow and sputtering voltage was studied, to optimize the control of the amount of reactive gas, and then reduce the influence of reactive gas on Mo/Si multilayer films during reactive sputtering. Based on this method, TiN, ZrN and TiO₂ capping layer were plated on the surface of Mo/Si multilayer films and were characterized by grazing incident X-ray reflection (GIXR), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). It is proved that the nitride capping layer has certain performance advantages.
- extreme ultraviolet multilayers /
- reactive magnetron sputtering /
- surface capping layer /
- nitride/oxide thin film

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图 1 Mo/Si多层膜GIXR测试及拟合结果

Figure 1. GIXR and fitting results of the Mo/Si multilayer film

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图 2 Ti靶电压与N₂流量关系

Figure 2. Relation between Ti target voltage and N2 flow rate

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图 3 Zr靶电压与N₂流量关系

Figure 3. Relation between Zr target voltage and N₂ flow rate

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图 4 Ti靶电压与O₂流量关系

Figure 4. Relation between Ti target voltage and O₂ flow rate

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图 5 含有TiN保护层的多层膜GIXR测试及其拟合结果

Figure 5. GIXR test and fitting results of multilayer film with TiN capping layer

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图 6 TiN薄膜XPS测试结果

Figure 6. XPS analysis results of TiN film

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图 7 含有TiN保护层的Mo/Si多层膜TEM测试结果

Figure 7. TEM analysis results of Mo/Si multilayer film with TiN capping layer

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图 8 含ZrN保护层的Mo/Si多层膜GIXR测试及其拟合结果

Figure 8. GIXR test and fitting results of multilayer film with ZrN capping layer

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图 9 ZrN薄膜XPS测试结果

Figure 9. XPS analysis results of ZrN film

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图 10 含有ZrN保护层的Mo/Si多层膜TEM测试结果

Figure 10. TEM analysis results of Mo/Si multilayer film with ZrN capping layer

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图 11 含有TiO2保护层的Mo/Si多层膜GIXR及其拟合结果

Figure 11. GIXR test and fitting results of multilayer film with TiO₂ capping layer

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图 12 TiO₂薄膜XPS测试结果

Figure 12. XPS analysis results of TiO₂ films

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图 13 含有TiO₂保护层的Mo/Si多层膜TEM测试结果

Figure 13. TEM analysis results of Mo/Si multilayer film with TiO₂ capping layer

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表 1 TiN_X薄膜成分表

Table 1. TiN_X film composition table

Material Mass fraction of Ti/% mass fraction of N/% Mass fraction of O/%

TiN_X 46.0 45.6 8.4

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表 2 ZrN_X薄膜成分表

Table 2. ZrN_X film composition table

Material Mass fraction of Zr/% Mass fraction of N/% Mass fraction of O/%

ZrN_X 46.9 45.7 7.4

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表 3 TiO_X薄膜成分表

Table 3. TiO_X film composition table

Material Mass fraction of Ti/% Mass fraction of O/%

TiO_X 33.5 66.5

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