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高亮度电子源驱动激光研究进展

石英彤 徐航 徐金强 黄森林

吴峥嵘, 施龙波, 江国栋, 等. 谐振环和矩形软波导性能研究[J]. 强激光与粒子束, 2025, 37: 023004. doi: 10.11884/HPLPB202537.240310
引用本文: 石英彤, 徐航, 徐金强, 等. 高亮度电子源驱动激光研究进展[J]. 强激光与粒子束, 2025, 37: 021001. doi: 10.11884/HPLPB202537.240261
Wu Zhengrong, Shi Longbo, Jiang Guodong, et al. Performance study of resonant ring and rectangular flexible waveguide[J]. High Power Laser and Particle Beams, 2025, 37: 023004. doi: 10.11884/HPLPB202537.240310
Citation: Shi Yingtong, Xu Hang, Xu Jinqiang, et al. Research progress on high-brightness electron source drive laser system[J]. High Power Laser and Particle Beams, 2025, 37: 021001. doi: 10.11884/HPLPB202537.240261

高亮度电子源驱动激光研究进展

doi: 10.11884/HPLPB202537.240261
基金项目: 国家自然科学基金项目(12175251)
详细信息
    作者简介:

    石英彤,shiyt@pku.edu.cn

    通讯作者:

    徐 航,xuhang@pku.edu.cn

  • 中图分类号: TN248.1

Research progress on high-brightness electron source drive laser system

  • 摘要: 光阴极电子源是先进加速器装置最为关键的部件,驱动激光的品质参数是电子源性能的首要决定因素。近年来,电子加速器装置的束流指标不断提升,要求驱动激光具备高功率、高稳定性等特点和时空分布调控的功能,这对驱动激光系统的放大、选频、倍频、时空整形等模块提出了更高的需求。国内外主要研究机构根据其电子源的需求采用了相应的技术路线,在重复频率、激光波长、单脉冲能量和时空分布整形等方面各有特点。本文介绍了高亮度电子源驱动激光的主要技术路线和国内外发展现状,分析了典型的驱动激光方案,并讨论了驱动激光系统的未来发展趋势,以期为相关装置的规划和建设提供参考。
  • 高增益[1-3]是速调管放大器一个重要的发展方向,增大输出腔的输出功率是提高增益的一种有效方式。如果反射功率为零,输出波导与输出腔的耦合就达到了匹配状态,输出腔的输出功率就达到了最大值。文献[4]给出了输出腔等效电路和输出功率计算公式。这里的输出腔等效电路采用变压器模型来研究输出腔与输出波导之间的耦合。输出功率计算公式是一种典型的传统算法。这种输出功率的算法得到了广泛的应用,基于圆盘模型的一维粒子模拟软件的输出功率的计算就是采用这种算法。按照传统算法,输出功率与工作频率无关,只与输出腔的间隙电压、特性阻抗和外观品质因数有关。本文提出了新的等效电路和输出功率计算公式[5-6]。输出腔等效电路以感应电流作为激励源,输出腔采用电阻、电容和电感组成并联电路,采用互感模型来研究输出腔与输出波导之间的耦合,采用传输线理论研究输出波导中的入射波和反射波。因为该模型为自洽模型,腔体通过电子束反馈回自身的效应通过感应电流来考虑,所以电子束阻抗在模型中不是必须的。当输出波导中的反射波为零时,带有调制电子束的输出腔与输出波导达到匹配状态。按照匹配理论,在匹配状态时,输出腔的工作频率与输出腔的谐振频率之间存在频率差。频率差是由输出腔的特性阻抗,感应电流和间隙电压决定的,同时还推出了匹配状态下输出腔有载品质因数的计算公式。从传统的输出腔的等效电路模型出发,无法推出完全匹配时输出腔谐振频率与有载品质因数的表达式。本文建立了较完整的带有电子束和输出波导的输出腔匹配理论即最大输出功率理论,推导了输出波导与带有电子束的输出腔之间任意的耦合和完全匹配这两种情形时输出微波功率和间隙电压关系的公式。将匹配情形时从含有互感的等效电路模型推出的输出功率的公式与传统的经典理论的公式进行比较,发现两者近似相等。

    这套理论不仅得出了一般情形时输出功率与间隙电压等参量的关系式,而且可以得出匹配情形时(输出波导内反射波为零)的输出功率与间隙电压等参量的关系式,以及匹配情形时的工作频率和输出腔的谐振频率两者之间关系式和有载品质因数的表达式。根据这两个表达式就可以计算出输出腔的谐振频率和外观品质因数,这两个参数可以作为输出腔的设计依据。

    图1给出了输出腔的等效电路模型[4-9]图1ig是在与腔体耦合的输出波导中产生的出射电流,ir是波导中的反向电流,Z0是波导特性阻抗,R是腔体并联电阻,L是腔体电感,C是腔体电容,i是腔体电路中流过互感M的电流,id=Mi1是腔体电路中由于调制电子束而引起的电流,通常被称为感应电流,M是电子束和输出腔之间的耦合系数,i1是束流的一次谐波。腔体和波导通过互感M互相耦合。输出腔阻抗Zcav由腔体并联阻抗R,腔体电容C,腔体电感L或者由R、腔体谐振频率f0、工作频率f和腔体特性阻抗R/RQQ给出

    图  1  输出腔等效电路图
    Figure  1.  Equivalent circuit model of a klystron output cavity
    1Zcav=1R+jωC+1jωL=1R+j(ff0f0f)1R/RQQ (1)

    这两种定义通过R/RQQ=1/12π f02π f0C(2π f0)2CL=1相联系。腔体间隙电压定义为在位置矢量r=(x,y,z)处腔体射频电场沿着某个感兴趣的路径S瞬时线积分

    Vgap(t)=SE(r,t)dl (2)

    腔体间隙电压是图1中腔体阻抗两端的电压,由下式给出

    Vgap=Zcav(idi) (3)

    这里我们将定义输出腔与外部波导耦合的模型。外部波导中同时存在带有电流ig和电压igZ0的出射波以及电流ir和电压irZ0的反射波。利用图1和互感的定义,我们可以得出腔体-波导电路中电流的表达式

    ig+ir=jωMZ0i (4)
    irig=(idi)ZcavjωM (5)

    式中:ω=2πf是工作角频率。

    首先我们将给出没有电子束和外部微波源关闭时的有载品质因数Q。冷腔有载品质因数定义为

    Ql=ωEstoredPloss (6)

    式中:Estored是腔体中平均储能,表示为

    Estored=141ω2C|iC|2+14L|iL|2 (7)

    式中:iC是流过电容器的电流,iL是流过电感的电流,平均功率损耗为

    Ploss=PG+Pe=12R|iR|2+12Z0|ig|2 (8)

    式中:iR是流过腔体电阻的电流,PG为腔体电阻损耗功率,Pe为从腔体泄漏到波导中的功率。在无反射波的情形下(ir=0)

    ig=(idi)ZcavjωM (9)
    iR=Zcav(idi)1R (10)
    iL=Zcav(idi)1jωL (11)
    iC=Zcav(idi)jωC (12)

    我们定义复耦合系数β

    β=Z0Zcavω2M2 (13)

    根据腔体与波导耦合系数β的定义

    β=PePG=Z0Rω2M2=βRZcav (14)

    没有电子束的有载品质因数为

    QL=Q011+β=Q011+βR/βRZcavZcav (15)

    其中固有品质因数

    Q0=ωCR2(1+1ω2CL) (16)

    反射微波功率为

    Pr=12Z0|ir|2 (17)

    从式(4)和式(5)中消去出射波,我们可以得到腔内驱动电流为

    i=2iridZcavjωMjωMZ0(1+β) (18)

    这个表达式可以用来推出间隙电压

    Vgap=Zcav(idi)=idZcav1+βj2irωM1+ββ (19)

    或者反过来,波导中的反射波为

    ir=1+βj2ωMβ(Vgap+idZcav1+β) (20)

    从这个表达式可以导出一般情形时反射微波功率为

    Pr=18|1+β|2|Vgap+idZcav1+β|2|Zcav||β| (21)

    输出微波功率为

    Pg=12Z0|ig|2 (22)

    下面分两种情形讨论。

    1)当复耦合系数β不等于1时:从式(4)和式(5)中消去反射波,我们可以得到腔内驱动电流为

    i=2ig+idZcavjωMjωMZ0(1β) (23)

    这个表达式可以用来推出间隙电压

    Vgap=Zcav(idi)=idZcav1βj2igωM1ββ (24)

    或者反过来,波导中的出射波为

    ig=1βj2ωMβ(Vgap+idZcav1β) (25)

    从这个表达式可以导出输出波导中的输出微波功率为

    Pg1=18|1β|2|Vgap+idZcav1β|2|Zcav||β| (26)

    2)当复耦合系数β等于1时:从式(4)和式(5)中消去反射波,我们可以得到出射电流为

    ig=idZcav2jωM (27)

    将式(27)代入式(22)可以导出输出微波功率为

    Pg2=18|id|2|Zcav| (28)

    如果输出波导中没有反射波,波导与腔体的耦合就达到了匹配。因为匹配将导致输出微波功率达到最大值,所以波导与腔体的匹配是波导和腔体的设计目标。

    从式(4)和式(5)得到

    2ir=ijωMZ0+(idi)ZcavjωM (29)

    ir为零可以导出

    i(1+β)=idβ (30)

    式(30)为匹配条件。在这种情形下,间隙电压为

    Vgap=Zcavid1+β (31)

    或者

    Vgap+idZcav1β=2Vgapββ1 (32)

    与这个条件相对应,匹配时输出微波功率为

    Pg1=12|β||Vgap|2|Zcav| (33)

    对于匹配条件式(30)必须满足,或者

    β=iidi (34)

    匹配时输出微波功率又可以写为

    Pg1=12Z0|ig|2=12ω2M2Z0|β|2|1+β|2|id|2 (35)

    β的定义式(13)和式(33)与式(15)可得

    Pg1=12|β||Zcav||Vgap|2=12|Vgap|2Q0QLQLR (36)

    通过比较复耦合系数β的定义式(13)和式(31),可以得出

    ω2M2=Z0id/idVgapVgap1/1ZcavZcav (37)

    这个方程等式左边为实数,右边通过工作频率的合适的选择也可以成为实数。定义(δ+1)f=f0,如果δ满足

    δ=R/RQQ2Im(id/idVgapVgap) (38)

    则式(37)右边成为实数。匹配时有载品质因数为

    QLt=Q011+Re(id/idVgapVgap1/1ZcavZcav)R (39)

    从谐振腔的一般理论[4]可以得出

    Pg=12Re(idVgap)=12|Vgap|21(R/RQQ)Qext (40)

    这里我们把它称为经典理论。对于输出腔来说,Qext远小于Q0QLQextR/RQQR/R(Q0QL)(Q0QL),匹配情形时的式(36)与式(40)近似相等。一般情形时的式(26)与式(40)只有通过数值计算进行比较。

    单重入输出腔的2维粒子模拟结构图如图2所示。图2中输出腔外径为5.6 cm,输出同轴线的内外径分别为5.2 cm和5.5 cm,特性阻抗Z0为3.365 Ω,间隙距离为1.4 cm,rarb分别等于2.4 cm和2.8 cm,为环形电子束的内半径和外半径,Rc等于3.0 cm为漂移管半径,鼻锥厚度为6 mm。在粒子模拟中束压为724.4 kV,束流为8[1+1.2sin(2πft)] kA,外加均匀磁场为1.2 T。输入腔谐振频率f0为2.933 GHz,特性阻抗R/RQQ为6.727 Ω,固有品质因数Q0为4 406.7,外观品质因数Qext为18.8,图1R为29 643.871 Ω,L为0.365×10−9 H,C为8.07 pF。

    图  2  带有输出波导和电子束的速调管输出腔示意图
    Figure  2.  Schematic of a klystron output cavity with output waveguide and beam

    当基波电流调制系数为1.2时,采用2维粒子模拟计算了输出微波功率与工作频率关系,计算结果如图3所示。从图3可知,当工作频率为2.906 GHz时,输出微波功率达到最大值;输出腔间隙耦合系数为0.635 9,基波电流为−9.6 kA,间隙电压为(6.767×105+2.742×105i) kV,复耦合系数为3.5276×10−2+2.875 3 i,互感为1.1299×10−9 H,腔体阻抗为(4.461+3.636×10−2 i)Ω。根据式(38)可以得出δ为0.010 6,所以匹配时工作频率为2.902 3 GHz,工作频率的理论值与粒子模拟的工作频率相差3.7 MHz。根据式(39)可以得出匹配时有载品质因数理论值为19.18,而粒子模拟的有载品质因数为18.72,两者相差0.46。按照式(21)计算的反射功率为1.5962 MW。按照式(26)计算的输出微波功率为2.058 GW,粒子模拟为1.935 GW,两者相差0.123 GW。按照式(36)计算的输出微波功率为2.107 6 GW。

    图  3  输出微波功率与工作频率关系图
    Figure  3.  Output power versus frequency

    匹配理论不仅得出了一般情形时输出功率与间隙电压等参量的关系式,而且可以得出匹配情形时(输出波导内反射波为零)的输出功率与间隙电压等参量的关系式,以及匹配情形时的工作频率和输出腔的谐振频率两者之间关系式和有载品质因数的表达式。根据这两个表达式就可以计算出输出腔的谐振频率和外观品质因数,这两个参数可以作为输出腔的设计依据。匹配情形时从含有互感的等效电路模型推出的输出功率的计算结果与经典理论的计算结果近似相等。

  • 图  1  SuperKEKB Yb/Nd驱动激光系统[15]

    Figure  1.  SuperKEKB Yb/Nd drive laser system[15]

    图  2  FLASH驱动激光系统[28]

    Figure  2.  FLASH drive laser system[28]

    图  3  PULSE结构示意图[26]

    Figure  3.  Structure of PULSE[26]

    图  4  PULSE放大器输出特性[26]

    Figure  4.  Output characteristics of PULSE amplifier[26]

    图  5  PULSE脉冲选择示意图[26]

    Figure  5.  Schematic of the pulse picking in PULSE[26]

    图  6  Cornell ERL驱动激光系统放大器[19]

    Figure  6.  Schematic of the rod fiber amplifier in Cornell ERL drive laser system[19]

    图  7  Cornell ERL驱动激光放大器输出特性[19]

    Figure  7.  Output characteristics of the drive laser amplifier at Cornell ERL[19]

    图  8  Cornell ERL驱动激光绿光输出特性[19]

    Figure  8.  Green laser output characteristics of Cornell ERL drive laser system[19]

    图  9  不同纵向分布对应的切片发射度与电流分布[54]

    Figure  9.  Slice emittance of optimized electron bunches for various profiles of photocathode pulses and beam current profiles[54]

    图  10  FERMI时间整形模块[58]

    Figure  10.  UV pulse shaping optical scheme at FERMI[58]

    图  11  脉冲堆叠前互相关测量脉宽和堆叠后脉宽[17]

    Figure  11.  Temporal intensity distribution of the incident laser and the output laser of incoherent stacking[17]

    图  12  PULSE相干整形模块[33]

    Figure  12.  Optical layout of the multiple birefringent crystal shaper used for PULSE[33]

    图  13  相干整形生成的脉冲实验测量与理论模拟结果[33]

    Figure  13.  Results of both the measured and the calculated pulse profiles after the shaper[33]

    图  14  SwissFEL空间整形与传输系统[30]

    Figure  14.  Beam transport and transverse beam profiles along the beam line at SwissFEL[30]

    图  15  DOE整形前后的光斑图形[15]

    Figure  15.  UV laser beam spatial distributions without and with the application of DOE[15]

    图  16  基于零色散压缩器和SLM的3D整形装置[65]

    Figure  16.  Schematic diagram of 3D shaper of laser pulse intensity distribution based on zero-dispersion compressor and SLM[65]

    图  17  3D整形激光产生的0.5 nC电子束分布[54]

    Figure  17.  Distribution of a 0.5 nC electron beam generated by 3D-shaped lasers[54]

    图  18  CBG的衍射效率与反射率分布[67]

    Figure  18.  Diffraction efficiency and reflection coefficient of the 3D CBG aperture[67]

    图  19  EuXFEL注入器布局图[16]

    Figure  19.  Injector building layout at EuXFEL[16]

    图  20  PULSE相干整形随时间和温度变化的稳定性[33]

    Figure  20.  Stability of PULSE multiple birefringent crystal shaper with respect to temporal and temperature variations[33]

    表  1  典型装置Ⅰ类放大器输出参数

    Table  1.   Output parameters of class Ⅰ amplifiers in typical facilities

    facility amplifier center wavelength/nm pulse energy/mJ repetition rate/Hz
    SXFEL Ti:sapphire 800.0 10.0 10/50
    HALF Ti:sapphire 800.0 13.0 1~100
    TTX Ti:sapphire 800.0 200.0 10
    SAPS Ti:sapphire 800.0 13.0 1~100
    PAL-XFEL Ti:sapphire 770.0 20.8 120
    FERMI Ti:sapphire 783.0 18.0 50
    SwissFEL Yb:CaF2 1 041.3 2.4 10
    SuperKEKB Yb-doped fiber/Nd:YAG hybrid 1 064.0 20.0 1~25
    下载: 导出CSV

    表  2  典型装置Ⅱ类放大器输出参数

    Table  2.   Output parameters of class Ⅱ amplifiers in typical facilities

    facility amplifier center wavelength/nm pulse energy/μJ repetition rate/MHz
    FLASH Yb-doped fiber/Yb:YAG hybrid 1030 180 1
    EuXFEL Nd:YVO4 1064 50 0.5/1.13/2.25/4.5
    LCLS-II Yb-doped fiber 1030 50 0~0.929
    DC-SRF-II Yb-doped fiber 1030 20 1
    S3FEL Yb-doped fiber 1030 50 1
    SHINE Yb-doped fiber 1030 150 1
    下载: 导出CSV

    表  3  典型装置Ⅲ类放大器输出参数

    Table  3.   Output parameters of class Ⅲ amplifiers in typical facilities

    facility amplifier center wavelength/nm average power/W repetition rate/MHz
    Cornell-ERL Yb-doped fiber 1040 167.0 1300
    PAPS Yb-doped fiber 1030 116.3 81.25/100/1300
    KEK-ERL Yb-doped fiber (solid-state oscillator) 1064 50.0 1300
    DC-SRF-II Yb-doped fiber 1030 99.3 81.25
    下载: 导出CSV

    表  4  典型装置倍频模块输出参数

    Table  4.   Output parameters of harmonic generation module in typical facilities

    facility frequency conversion method crystal center wavelength/nm pulse energy repetition rate
    FLASH FHG LBO+BBO 257.5 6.1 μJ/11.2 μJ 1 MHz
    LCLS-II FHG BBO 257.5 300 nJ 0~0.929 MHz
    S3FEL FHG BBO 257.5 2 μJ 1 MHz
    SHINE FHG LBO+BBO 257.5 2 μJ 1 MHz
    SwissFEL FHG BBO 260 600 μJ 10 Hz
    EuXFEL FHG LBO+BBO 266 5 μJ 4.5 MHz
    SuperKEKB FHG BBO 266 1 mJ 25 Hz
    TTX THG BBO 266.7 1 mJ 10 Hz
    SXFEL THG BBO 266.7 1.2 mJ 10 Hz/50 Hz
    HALF THG BBO 266.7 2 mJ 1~100 Hz
    SAPS THG BBO 266.7 2 mJ 1~100 Hz
    FERMI THG BBO 261 2.3 mJ 50 Hz
    DC-SRF-II SHG LBO 515 2 μJ/170 nJ 1 MHz/81.25 MHz
    Cornell-ERL SHG LBO 520 95 nJ 1.3 GHz
    KEK-ERL SHG LBO 532 0.77 nJ 1.3 GHz
    PAPS SHG LBO 515 492 nJ 81.25 MHz
    下载: 导出CSV
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  • 收稿日期:  2024-08-12
  • 修回日期:  2024-12-18
  • 录用日期:  2024-12-18
  • 网络出版日期:  2025-01-17
  • 刊出日期:  2025-02-15

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