Ultrafast dynamics of intense femtosecond laser ablation of silicon
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摘要: 利用基于Pump-probe系统的超快时间分辨阴影图的方法，研究了空气中飞秒激光烧蚀单晶硅的动力学过程。实验采用脉宽为50 fs、平均能量密度约35 J/cm2的单脉冲激光烧蚀单晶硅，获取飞秒激光烧蚀单晶硅过程中等离子体和冲击波的形成和发展过程的时间分辨阴影图。实验结果表明：飞秒激光烧蚀单晶硅导致其表面物质喷发的过程是不连续的，分为明显的两次喷发过程。这表明飞秒激光与单晶硅作用的过程中，在不同的时间段可能由不同的机制主导，在前期可能是多光子电离为主，在后期可能是由多光子效应和雪崩效应共同作用。研究还发现，延迟时间较长时，冲击波形状发生畸变。Abstract: The dynamic process of intense 50 fs laser ablation of silicon is investigated by the way of ultrafast time-resolved shadowgraphy. The formation and development processes of plasma and shock wave are recorded, and it is known that the process of material ejection is discontinuous. The process can be divided obviously into two processes, which shows that at different stages there are different mechanism leading the interaction of laser and material. In the shadowgraph of 19 ns time delay, it is found that the shock wave is distorted from the hemispherical shape.
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Key words:
- femtosecond laser /
- time-resolved shadowgraphs /
- laser ablation /
- shock wave
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