喷嘴-平板直流电晕放电中的OH(A2S+→X2P, 0-0)光谱研究
OH(A2S+→X2P, 0-0) emission spectrum in nozzle-to-plate DC corona discharge
-
摘要: 为更深入地认识电晕放电低温等离子体中自由基的生成机理,以发射光谱测量为基础并结合背景气体淬灭率影响,研究了常压下喷嘴-平板电晕自由基簇射过程中放电参数、背景气体、电极气成分等因素对OH(A2S+→X2p, 0-0)发光的影响。结果表明:在放电参数影响中,放电电压及放电电流都会影响OH生成量,OH发光随功率增加而大大增强;在加湿氮气直流电晕放电中有明显的OH(A2S+→X2p, 0-0)光谱存在,但加湿空气条件下OH生成较少;载气增湿后OH生成量明显增多,而Ar和O2的存在分别增强和减弱了OH(A2S+→X2p, 0-0)发光,可能的原因是这两种物质影响了放电和OH(A2S+)的淬灭。Abstract: In order to get extensive knowledge of radical production in a corona induced non-thermal plasma, the effect of discharge parameter, gas condition on emission intensity of OH(A2S+→X2P, 0-0) in a nozzle-to-plate corona radical shower system are experimentally investigated using emission spectroscopy considering the collisional quenching rate. The results are that: both discharge voltage and current have direct influence on OH emission, OH production increases as discharge power rises; remarkable emission spectrum of OH(A2S+→X2P, 0-0) is detected in N2 DC corona discharge, but few OH radicals exist in air discharge; humidification of electrode gas can enhance the OH emission, and the existence of Ar increases the OH emission, while O2 may reduce the OH emission, the possible reason is th
-
Key words:
- oh radical /
- emission spectrum /
- corona /
- radical /
- discharge /
- quenching
点击查看大图
计量
- 文章访问数: 2470
- HTML全文浏览量: 337
- PDF下载量: 529
- 被引次数: 0