酸蚀与紫外激光预处理结合提高熔石英损伤阈值
Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning
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摘要: 采用HF酸刻蚀和紫外激光预处理相结合的方式提升熔石英元件的负载能力，用质量分数为1%的HF缓冲溶液对熔石英刻蚀1~100 min，综合透过率、粗糙度和损伤阈值测试结果，发现刻蚀时间为10 min的熔石英抗损伤能力最佳。采用355 nm紫外激光对HF酸刻蚀10 min的熔石英进行预处理，结果表明：紫外预处理能量密度在熔石英零损伤阈值的60%以下时，激光损伤阈值单调递增；能量到达80%时，阈值反而低于原始样片的损伤阈值。适当地控制酸蚀时间和紫外激光预处理参数能有效提高熔石英的抗损伤能力。Abstract: Acid etching combined with UV laser conditioning is developed to enhance the laser induced damage threshold (LIDT) of fused silica. Firstly, the fused silica is etched for 1~100 min with a buffered 1% HF solution. After acid etching, its transmittance, surface roughness and LIDT are measured. The results reveal that the fused silica has the highest LIDT and transmittance after etching for 10 min. Then UV laser (355 nm) conditioning is adopted to process the 10-min-etched fused silica. When the laser fluence is below 60% of fused silica’s zero probability damage threshold, the LIDT increases gradually with the increase of laser conditioning fluence. However, the LIDT rapidly decreases to be lower than the threshold of the 10-min-etched fused silica when the conditioning fluence is up to 80
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Key words:
- fused silica /
- chemical etching /
- laser conditioning /
- transmittance /
- laser induced damage threshold
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