Detecting tin droplet used for EUV source

Chen Ziqi; Wang Xinbing; Zuo Duluo; Lu Peixiang; Wu Tao

doi:10.11884/HPLPB201426.121005

Volume 26 Issue 12

Sep. 2015

Turn off MathJax

Article Contents

Article Navigation > High Power Laser and Particle Beams > 2014 > 26(12): 121005

Chen Ziqi, Wang Xinbing, Zuo Duluo, et al. Detecting tin droplet used for EUV source[J]. High Power Laser and Particle Beams, 2014, 26: 121005. doi: 10.11884/HPLPB201426.121005

Citation:

Chen Ziqi, Wang Xinbing, Zuo Duluo, et al. Detecting tin droplet used for EUV source[J]. High Power Laser and Particle Beams, 2014, 26: 121005. doi: 10.11884/HPLPB201426.121005

Chen Ziqi, Wang Xinbing, Zuo Duluo, et al. Detecting tin droplet used for EUV source[J]. High Power Laser and Particle Beams, 2014, 26: 121005. doi: 10.11884/HPLPB201426.121005

Citation:

Chen Ziqi, Wang Xinbing, Zuo Duluo, et al. Detecting tin droplet used for EUV source[J]. High Power Laser and Particle Beams, 2014, 26: 121005. doi: 10.11884/HPLPB201426.121005

PDF( 2032 KB)

Detecting tin droplet used for EUV source

doi: 10.11884/HPLPB201426.121005

1.
Wuhan National Laboratory for Optoelectronics,Huazhong University of Science and Technology,Wuhan 430074,China;
2.
School of Science,Wuhan Institute of Technology,Wuhan 430205,China

Received Date: 2014-08-25
Rev Recd Date: 2014-10-17
Publish Date: 2014-12-16

Abstract

Abstract

A detecting system is set up based on image processing used for EUV source. The tin target motion and stability are displayed by image capturing and processing in real time. The system is tested when tin droplet is generated by the tin generator at 34 kHz. The result reveals that tin droplet size is close to 137 m, and the distance between every two drops is about 375 m. The lateral droplet stability is analyzed which contributes to laser produced plasma EUV source.
- extreme ultraviolet source,
- laser plasma photosource,
- tin droplet,
- stability