Volume 27 Issue 01
Jan.  2015
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Sun Jianfeng, Hu Yang, Sun Jiang, et al. An average method for intense pulsed electron beam incident angles[J]. High Power Laser and Particle Beams, 2015, 27: 014001. doi: 10.11884/HPLPB201527.014001
Citation: Sun Jianfeng, Hu Yang, Sun Jiang, et al. An average method for intense pulsed electron beam incident angles[J]. High Power Laser and Particle Beams, 2015, 27: 014001. doi: 10.11884/HPLPB201527.014001

An average method for intense pulsed electron beam incident angles

doi: 10.11884/HPLPB201527.014001
  • Received Date: 2014-04-29
  • Rev Recd Date: 2014-10-25
  • Publish Date: 2015-01-20
  • Electron incident angles have a heavy effect on the energy deposition profile (EDP) in material of the intense pulsed electron beam. The average of electron incident angles must be taken into consideration when carrying out the diagnosis technology research and numerical simulation study, while a widely received method to solve the problem has not yet been presented. This article gives a qualitative analysis on the energy deposition function, which is formed by the energy loss function and energy deposition efficiency function. An average method of electron beam incident angles based on EDP, which is named as EDP average method, is developed, and a qualitative explanation of the electron beam EDP curve is given. The error and applicability of this method are analyzed. M-C tests are designed for comparison with theoretical analysis. The EDP average method has a better performance in calculation of the EDP than the method using arithmetic average directly, especially in the shallow of target material.
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