Zhao Songnan, Lv Haibing, Wang Tao, et al. Preparation of sol-gel three-wavelength antireflective film[J]. High Power Laser and Particle Beams, 2015, 27: 014101. doi: 10.11884/HPLPB201527.014101
Citation:
Zhao Songnan, Lv Haibing, Wang Tao, et al. Preparation of sol-gel three-wavelength antireflective film[J]. High Power Laser and Particle Beams, 2015, 27: 014101. doi: 10.11884/HPLPB201527.014101
Zhao Songnan, Lv Haibing, Wang Tao, et al. Preparation of sol-gel three-wavelength antireflective film[J]. High Power Laser and Particle Beams, 2015, 27: 014101. doi: 10.11884/HPLPB201527.014101
Citation:
Zhao Songnan, Lv Haibing, Wang Tao, et al. Preparation of sol-gel three-wavelength antireflective film[J]. High Power Laser and Particle Beams, 2015, 27: 014101. doi: 10.11884/HPLPB201527.014101
Based on simulation and experiment, the way to get three-wavelength antireflective film was researched, A synthesis procedure of SiO2 colloid derived from acid-alkali 2-step catalyzed hydrolysis was disclosed. Two sols were compounded and the three-wavelength antireflective films with transmittances of 351 nm, 527 nm and 1053 nm by over 99.5%, 98% and 98%, were prepared. The properties of the coatings were characterized with TEM, AFM, spectroscopic ellipsometry and spectrophotometer. Three-wavelength antireflective coating on the running performance of high power laser device lifting played a positive role in promoting.