Laser conditioning effect of HfO<sub>2</sub>/SiO<sub>2</sub> high reflectors at 532 nm

Liu Jie; Zhang Weili; Zhu Meiping

doi:10.11884/HPLPB201527.032034

Volume 27 Issue 03

Mar. 2015

Turn off MathJax

Article Contents

Abstract

References

Article Navigation > High Power Laser and Particle Beams > 2015 > 27(03): 032034

Ma Lianying, Zhou Songqing, Huang Chao, et al. Purifying technology for non-chain discharge-pumped HF laser media at high frequency[J]. High Power Laser and Particle Beams, 2018, 30: 051003. doi: 10.11884/HPLPB201830.170313

Citation:

Liu Jie, Zhang Weili, Zhu Meiping. Laser conditioning effect of HfO₂/SiO₂ high reflectors at 532 nm[J]. High Power Laser and Particle Beams, 2015, 27: 032034. doi: 10.11884/HPLPB201527.032034

Citation:

Liu Jie, Zhang Weili, Zhu Meiping. Laser conditioning effect of HfO₂/SiO₂ high reflectors at 532 nm[J]. High Power Laser and Particle Beams, 2015, 27: 032034. doi: 10.11884/HPLPB201527.032034

PDF( 3014 KB)

Laser conditioning effect of HfO₂/SiO₂ high reflectors at 532 nm

doi: 10.11884/HPLPB201527.032034

Liu Jie^1,2,
Zhang Weili^{1
,
,},
Zhu Meiping¹

1.
Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;
2.
University of Chinese Academy of Sciences,Beijing 100049,China

Received Date: 2014-03-15
Rev Recd Date: 2014-11-15
Publish Date: 2015-02-10

Abstract

Abstract

Two different laser conditioning methods including n% raster scanning and R-on-1 test were conducted to investigate the conditioning effect of 532 nm high reflectors. The Nd: YAG second harmonic laser was employed to do 1-on-1 test for 532 nm high reflectors prepared by electron beam evaporation. Afterwards, n% raster scanning and R-on-1 test were done for comparison. The analysis of damage probability and damage morphologies shows that, laser conditioning could eliminate the defects with low threshold in coatings, thus enhancing the laser damage threshold of 532 nm high reflectors (by 38% and 30% in n% raster scanning and k-on-1 test, respectively). 
- E-beam evaporation,
- 532 nm high reflective coatings,
- laser conditioning,
- laser-induced damage threshold,
- defects

FullText(HTML)

References(0)

References

Relative Articles

[1]	Sui Tingting, Wei Liening, Xu Mingxia, Xu Xinguang, Sun Xun, Ju Xin. Effects of Fe and its cluster defects on laser damage of KDP and ADP crystals using first-principles[J]. High Power Laser and Particle Beams, 2023, 35(6): 061003. doi: 10.11884/HPLPB202335.220397
[2]	Zhao Yuanan, Lian Yafei, Li Ting, Peng Xiaocong, Wang Yueliang, Wu Jinming, Chang Junxiu, Hu Guohang, Shao Jianda. Laser damage of KDP crystals and their analogues[J]. High Power Laser and Particle Beams, 2023, 35(7): 071001. doi: 10.11884/HPLPB202335.220417
[3]	Li Yunfei, Shi Jinfang, Qiu Rong, Yu Jian, Guo Decheng, Zhou Lei. Effect of 355 nm and 1064 nm dual-wavelength conditioning on the bulk damage properties of DKDP crystal[J]. High Power Laser and Particle Beams, 2022, 34(6): 061003. doi: 10.11884/HPLPB202234.220060
[4]	Pan Shunmin, Wei Yaowei, An Chenhui, Luo Zhenfei, Wang Jian. Electric field enhancement effect and damage characteristics of nodular defect in 45° high-reflection coating[J]. High Power Laser and Particle Beams, 2020, 32(7): 071006. doi: 10.11884/HPLPB202032.200028
[5]	Xie Lingyun, He Tao, Zhang Jinlong, Jiao Hongfei, Ma Bin, Wang Zhanshan, Cheng Xinbin. Improve the LIDT of high-reflection coatings by planarizing nodular defects[J]. High Power Laser and Particle Beams, 2018, 30(9): 092001. doi: 10.11884/HPLPB201830.180067
[6]	Dai Fu, Yang Liming. Laser conditioning methods for hafnia silica multilayer high-reflective coatings[J]. High Power Laser and Particle Beams, 2013, 25(04): 929-934.
[7]	Dai Fu, Yang Liming. Laser coverage on defect in laser conditioning process[J]. High Power Laser and Particle Beams, 2012, 24(06): 1385-1390. doi: 10.3788/HPLPB20122406.1385
[8]	Ye Xiaowen, Wang Xiaodong, Cheng Xinbin, Ma Bin, Ding Tao, Shen Zhengxiang, Wang Zhanshan. Influence of substrate cleaning on laser-induced damage threshold of polarizers[J]. High Power Laser and Particle Beams, 2012, 24(10): 2338-2342. doi: 10.3788/HPLPB20122410.2338
[9]	zhou gang, ma bin, jiao hongfei, ding tao, zhang jinlong, shen zhengxiang, cheng xinbin, wang zhanshan. Laser damage threshold measurements of 1 064 nm high-reflection mirrors[J]. High Power Laser and Particle Beams, 2011, 23(04): 0- .
[10]	xu shizhen, jiang xiaodong, zheng wanguo, yuan xiaodong, zu xiaotao. Effects of pre-conditioning on 355 nm laser-induced damage growth of fused silica[J]. High Power Laser and Particle Beams, 2010, 22(07): 0- .
[11]	chen meng, xiang xia, jiang yong, zu xiaotao, yuan xiaodong, zheng wanguo, wang haijun, li xibin, jiang xiaodong, wang chengcheng, . Enhancement of laser induced damage threshold of fused silica by acid etching combined with UV laser conditioning[J]. High Power Laser and Particle Beams, 2010, 22(06): 0- .
[12]	wu shi-gang. Phase transition model analysis of ZrO2 thin film deposited by electron-beam evaporation[J]. High Power Laser and Particle Beams, 2008, 20(10): 0- .
[13]	li da-wei, tao chun-xian, li xiao, zhao yuan-an, shao jian-da. Comparison of laser induced damage at 1 064 nm and 532 nm to highreflective film fabricated by electron beam evaporation[J]. High Power Laser and Particle Beams, 2008, 20(09): 0- .
[14]	dai fu, xiong sheng-ming, wang wen-liang, zhang yun-dong. Damage induced by inclusions in coatings under repetition frequency pulse laser[J]. High Power Laser and Particle Beams, 2007, 19(07): 0- .
[15]	huang jin, zhao song-nan, lu hai-bing, jiang xiao-dong, yuan xiao-dong, zheng wan-guo. Damage-threshold increase of pickoff optics using 1 064 nm wavelength laser[J]. High Power Laser and Particle Beams, 2007, 19(05): 0- .
[16]	cui yun, zhao yuan-an, he hong-bo, fan zheng-xiu, shao jian-da. Effects of ultrasonics cleaning and laser conditioning on the laser induced damage threshold of the antireflection[J]. High Power Laser and Particle Beams, 2006, 18(10): 0- .
[17]	liu qiang, lin li bin, gan rong bing, tang fang yuan, zha xi ci ren, . Experiment study on the uniformity of damage threshold of oxide films[J]. High Power Laser and Particle Beams, 2003, 15(11): 0- .
[18]	gan rong-bing, lin li-bin, lu yong, liu qiang, zuo zhi-yun, jiang xiao-dong, huang zhu-xin, ye lin. Laser-induced bulk damage of UBK7 glass owing to its rear-surface defects[J]. High Power Laser and Particle Beams, 2001, 13(05): 0- .
[20]	gao hongyi, lou qihong, dong jingxing, ding aizhen. MONITORING AND MEASUREMENT OF DAMAGE HRESHOLD ON HR AND AR COATINGS FOR THE 308 nm EXCIMER LASER[J]. High Power Laser and Particle Beams, 1998, 10(01): 0- .

Supplements(0)

Cited By

Cited by

Periodical cited type(2)

1.	周文超，魏千翯，彭琛，黄德权，朱日宏. 2.7～3.0μm波段高反镜反射率测量研究. 强激光与粒子束. 2024(01): 101-106 . 本站查看
2.	陶蒙蒙，马连英，黄超，朱峰，黄珂，沈炎龙，谌鸿伟，栾昆鹏，赵柳，李高鹏，易爱平. 吸附条件对重频运转的焦级非链式脉冲HF激光器输出能量的影响. 现代应用物理. 2019(04): 34-39 .