Liu Jie, Zhang Weili, Zhu Meiping. Laser conditioning effect of HfO2/SiO2 high reflectors at 532 nm[J]. High Power Laser and Particle Beams, 2015, 27: 032034. doi: 10.11884/HPLPB201527.032034
Citation:
Liu Jie, Zhang Weili, Zhu Meiping. Laser conditioning effect of HfO2/SiO2 high reflectors at 532 nm[J]. High Power Laser and Particle Beams, 2015, 27: 032034. doi: 10.11884/HPLPB201527.032034
Liu Jie, Zhang Weili, Zhu Meiping. Laser conditioning effect of HfO2/SiO2 high reflectors at 532 nm[J]. High Power Laser and Particle Beams, 2015, 27: 032034. doi: 10.11884/HPLPB201527.032034
Citation:
Liu Jie, Zhang Weili, Zhu Meiping. Laser conditioning effect of HfO2/SiO2 high reflectors at 532 nm[J]. High Power Laser and Particle Beams, 2015, 27: 032034. doi: 10.11884/HPLPB201527.032034
Two different laser conditioning methods including n% raster scanning and R-on-1 test were conducted to investigate the conditioning effect of 532 nm high reflectors. The Nd: YAG second harmonic laser was employed to do 1-on-1 test for 532 nm high reflectors prepared by electron beam evaporation. Afterwards, n% raster scanning and R-on-1 test were done for comparison. The analysis of damage probability and damage morphologies shows that, laser conditioning could eliminate the defects with low threshold in coatings, thus enhancing the laser damage threshold of 532 nm high reflectors (by 38% and 30% in n% raster scanning and k-on-1 test, respectively).
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