Laser induced damage properties for HfO<sub>2</sub> thin films deposited by atomic layer deposition

Wei Yaowei; Wang Zhen; Pan Feng

doi:10.11884/HPLPB201527.052004

Volume 27 Issue 05

Apr. 2015

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Article Navigation > High Power Laser and Particle Beams > 2015 > 27(05): 052004

Liu Yongkang, Wang Fei, Huang Hongwen, et al. Severe accident mitigation system for subcritical energy cladding[J]. High Power Laser and Particle Beams, 2015, 27: 016007. doi: 10.11884/HPLPB201527.016007

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Wei Yaowei, Wang Zhen, Pan Feng. Laser induced damage properties for HfO₂ thin films deposited by atomic layer deposition[J]. High Power Laser and Particle Beams, 2015, 27: 052004. doi: 10.11884/HPLPB201527.052004

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Laser induced damage properties for HfO₂ thin films deposited by atomic layer deposition

doi: 10.11884/HPLPB201527.052004

1.
Research Center of Laser Fusion,CAEP,P.O.Box 919-987,Mianyang 621900,China

Received Date: 2014-10-12
Rev Recd Date: 2015-01-29
Publish Date: 2015-04-24

Abstract

Abstract

In this paper, ALD was used to deposit HfO2 single layer films with organic and inorganic precursors at 100, 200 and 300 ℃, respectively. Optical properties such as film absorption, refractive index and microstructure were investigated. Especially, laser damage properties as a key property for thin films used as laser system components were analyzed using 1-on-1 measurement method. Laser damage morphologies were analyzed by scan electron microscope (SEM). For the HfO2 thin films deposited with different process parameters, the damage was mainly caused by film absorption and crystallization. When the HfCl4 precursor was used at 100 ℃, HfO2 films had the least absorption and the best LIDT (about 31.8 J/cm2, 1064 nm, 3 ns), which was the best result as reported.
- inertial confinement fusion,
- high power laser system,
- atomic layer deposition,
- laser induced damage threshold,
- HfO2 thin film

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