Volume 27 Issue 08
Sep.  2015
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Luo Shiwen, Zuo Duluo, Wang Xinbing. Kinetic simulation of discharge excited ArF excimer laser and parameter analysis[J]. High Power Laser and Particle Beams, 2015, 27: 081006. doi: 10.11884/HPLPB201527.081006
Citation: Luo Shiwen, Zuo Duluo, Wang Xinbing. Kinetic simulation of discharge excited ArF excimer laser and parameter analysis[J]. High Power Laser and Particle Beams, 2015, 27: 081006. doi: 10.11884/HPLPB201527.081006

Kinetic simulation of discharge excited ArF excimer laser and parameter analysis

doi: 10.11884/HPLPB201527.081006
  • Received Date: 2015-03-08
  • Rev Recd Date: 2015-06-10
  • Publish Date: 2015-08-11
  • A one-dimensional fluid model is used to investigate the kinetics of discharge excited ArF excimer laser. Voltage-current waveforms of the gas discharge process coupling with the discharge circuit are obtained. Temporal-spatial evolution of electron number density, photon number density and electric field are obtained and influence of discharge parameters on the laser output are analyzed. The results show that circuit parameters, pressure and fluorine gas ratio all have significant influence on laser output. The inductance has a little influence on the output which result in a large parameter set. Low peaking capacitance is beneficial to long pulse and too high or too low pressure and fluorine gas ratio result in small output.
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