Jia Rui, Zeng Yonghu, Wang Chuanchuan. Uniformity of electromagnetic field in a pulse excited reverberation chamber[J]. High Power Laser and Particle Beams, 2015, 27: 103220. doi: 10.11884/HPLPB201527.103220
Citation:
Jia Rui, Zeng Yonghu, Wang Chuanchuan. Uniformity of electromagnetic field in a pulse excited reverberation chamber[J]. High Power Laser and Particle Beams, 2015, 27: 103220. doi: 10.11884/HPLPB201527.103220
Jia Rui, Zeng Yonghu, Wang Chuanchuan. Uniformity of electromagnetic field in a pulse excited reverberation chamber[J]. High Power Laser and Particle Beams, 2015, 27: 103220. doi: 10.11884/HPLPB201527.103220
Citation:
Jia Rui, Zeng Yonghu, Wang Chuanchuan. Uniformity of electromagnetic field in a pulse excited reverberation chamber[J]. High Power Laser and Particle Beams, 2015, 27: 103220. doi: 10.11884/HPLPB201527.103220
The field uniformity of electromagnetic in a pulse excited reverberation chamber was investigated in simulations and experiments. The definition and calculation method were proposed and the results of both aspects were analyzed. The results showed that the field uniformity of pulse excited reverberation chamber is fulfilled with the requirement of IEC standard both in time and frequency domains. The fact that the statistical uniformity field can be built in pulse excited reverberation chamber suggests that the susceptive experiments under electromagnetic pulse field can be performed in reverberation chamber.