Improvement of film thickness uniformity in meniscus coating

Lin Jiping; Liu Zhengkun; Hong Yilin; Jiang Xiaolong; Qiu Keqiang; Liu Ying; Xu Xiangdong; Fu Shaojun

doi:10.11884/HPLPB201527.121003

Volume 27 Issue 12

Jan. 2016

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Article Navigation > High Power Laser and Particle Beams > 2015 > 27(12): 121003

Wu Hanyu, Zhang Xinjun, Wang Liangping, et al. Restraint of focus spot drift of electron-beam in bremsstrahlung radiation[J]. High Power Laser and Particle Beams, 2015, 27: 075105. doi: 10.11884/HPLPB201527.075105

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Lin Jiping, Liu Zhengkun, Hong Yilin, et al. Improvement of film thickness uniformity in meniscus coating[J]. High Power Laser and Particle Beams, 2015, 27: 121003. doi: 10.11884/HPLPB201527.121003

Citation:

Lin Jiping, Liu Zhengkun, Hong Yilin, et al. Improvement of film thickness uniformity in meniscus coating[J]. High Power Laser and Particle Beams, 2015, 27: 121003. doi: 10.11884/HPLPB201527.121003

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Improvement of film thickness uniformity in meniscus coating

doi: 10.11884/HPLPB201527.121003

1.
National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029,China;
2.
School of Physics and Material Science,Anhui University,Hefei 230601,China

Received Date: 2015-09-14
Rev Recd Date: 2015-10-09
Publish Date: 2015-11-26

Abstract

Abstract

It is difficult to coat photoresist uniformly on large plates for diffraction optics component fabrication. The relationship between photoresist thickness and scan velocity is experimentally explored by a small meniscus coating applicator. Aside from the thickness, the distribution uniformity of the thickness is also important and is experimentally found it is mainly dependent on system stability. Firstly, the relationship between the thickness uniformity and the scan velocity is explored and optimized. Secondly, interspace variations during the scan process with different coating parameters are measured in situ using a non-contact laser triangulation sensor, it is limited to 15 m in the scan process. Several variation reduction measures are adopted. After parameter optimization and system improvement, the photoresist is uniformly coated with a peak-to-valley (PV) value of 3% and a root-mean-square deviation of 0.5% to fabricate diffractive optic plates.
- meniscus coating,
- large area diffractive optic plates,
- photoresist uniformity coating

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