Influence of fabrication conditions on inhomogeneity of large dimensions SiO<sub>2</sub> thin film

Wang Li; Wang Peng; Wang Gang; Wang Peipei; Bai Yunli; Liu Huasong

doi:10.11884/HPLPB201628.022003

Volume 28 Issue 02

Jan. 2016

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Article Navigation > High Power Laser and Particle Beams > 2016 > 28(02): 022003

Xiao Dengjie, Qiao Yusi, Chu Zhongming. Orbit correction based on machine learning[J]. High Power Laser and Particle Beams, 2021, 33: 054004. doi: 10.11884/HPLPB202133.200352

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Wang Li, Wang Peng, Wang Gang, et al. Influence of fabrication conditions on inhomogeneity of large dimensions SiO₂ thin film[J]. High Power Laser and Particle Beams, 2016, 28: 022003. doi: 10.11884/HPLPB201628.022003

Xiao Dengjie, Qiao Yusi, Chu Zhongming. Orbit correction based on machine learning[J]. High Power Laser and Particle Beams, 2021, 33: 054004. doi: 10.11884/HPLPB202133.200352

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Influence of fabrication conditions on inhomogeneity of large dimensions SiO₂ thin film

doi: 10.11884/HPLPB201628.022003

1.
Beijing Institute of Space Mechanics &Electricity,Beijing 100094,China;
2.
Tianjin Jinhang Institute of Technical Physics,Tianjin 300192,China

Received Date: 2015-10-01
Rev Recd Date: 2015-11-23
Publish Date: 2016-02-15

Abstract

Abstract

With increasing of deposition machines dimension, the growth process of thin film material will show new phenomena. In order to get homogenous large caliber optical thin film, different single SiO2 layers were fabricated using ion-assisted electric gun evaporation under different ion source energy, deposition pressure, substrate temperature and different rotation speed. Spectroscopic ellipsometry and spectrometer were used to measure SiO2 samples ellipsometric parameters and transmission spectra, respectively. Refractive index and its distribution were got by fitting the corresponding measurement results. It is shown that rotation speed is the main cause for the inhomogeneity of large caliber SiO2 thin film. Ion source energy, deposition pressure and substrate temperature can modulate the inhomogeneity by affecting SiO2 thin films growing process. When the rotation speed is limited for large dimension optical elements, homogenous optical thin film can also be got by optimizing other deposition parameters.
- electric beam evaporation,
- stacking density,
- inhomogeneity,
- fabrication parameters,
- optical thin film

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