Optimization of silicon etching process using response surface method

Fu Wenting; Liang Qiao; Cui Kefu; Shi Tianli; Zhang Na; Zheng Dongming; Tang Hui; Sun Haiwei

doi:10.11884/HPLPB201628.064109

Volume 28 Issue 06

May 2016

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Gao Lei, Zeng Yonghu, Wang Liandong, et al. Application strategy for intermittent sampling repeater jamming to wideband imaging radar[J]. High Power Laser and Particle Beams, 2018, 30: 053203. doi: 10.11884/HPLPB201830.170430

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Fu Wenting, Liang Qiao, Cui Kefu, et al. Optimization of silicon etching process using response surface method[J]. High Power Laser and Particle Beams, 2016, 28: 064109. doi: 10.11884/HPLPB201628.064109

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Optimization of silicon etching process using response surface method

doi: 10.11884/HPLPB201628.064109

1.
Shenyang Academy of Instrumentation Science Co Ltd,Shenyang 110043,China

Received Date: 2015-11-16
Rev Recd Date: 2015-12-10
Publish Date: 2016-06-15

Abstract

Abstract

In this paper, the response surface methodology(RSM) is applied to optimizing the operating conditions of silicon etching for pressure sensor fabrication. Three operating parameters, the temperature, the KOH concentration and the etching time are considered in this study, and the ranges of them are 40-60℃, 0.4-0.48 mol/L and 5-12.5 h, respectively. A quadratic model is established to describe the anisotropic etching rate as the response value, and the individual effects of these operating parameters and the combined effects of multiple operating conditions on etching rate are examined.
- KOH anisotropic,
- response surface methodology,
- etching rate,
- sensor

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