Form and correction of a new type of artifact induced by beam hardening

Chen Yunbin; Chen Si; Li Jing

doi:10.11884/HPLPB201628.160047

Volume 28 Issue 10

Aug. 2016

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Article Navigation > High Power Laser and Particle Beams > 2016 > 28(10): 104001

Hao Yong, Li Yongdong, Ding Zhenjie, et al. Pre-pulse mechanism and effects of parameters in semiconductor opening switches[J]. High Power Laser and Particle Beams, 2018, 30: 065001. doi: 10.11884/HPLPB201830.170516

Citation:

Chen Yunbin, Chen Si, Li Jing. Form and correction of a new type of artifact induced by beam hardening[J]. High Power Laser and Particle Beams, 2016, 28: 104001. doi: 10.11884/HPLPB201628.160047

Citation:

Chen Yunbin, Chen Si, Li Jing. Form and correction of a new type of artifact induced by beam hardening[J]. High Power Laser and Particle Beams, 2016, 28: 104001. doi: 10.11884/HPLPB201628.160047

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Form and correction of a new type of artifact induced by beam hardening

doi: 10.11884/HPLPB201628.160047

Chen Yunbin^{1,2
,
,},
Chen Si^1,2,
Li Jing^1,2

1.
Institute of Applied Electronics,CAEP,Mianyang 621900,China;
2.
National X-ray Digital Imaging Instrument Center,Mianyang 621000,China

Received Date: 2016-01-28
Rev Recd Date: 2016-03-28
Publish Date: 2016-10-15

Abstract

Abstract

X-ray beam hardening is one of the physical processes that degrade the quality of ICT reconstructed images. Commonly, beam hardening artifacts perform as cupping artifacts and streak artifacts. This paper illustrates and demonstrates a new type of beam hardening artifact. It is closely related to the structure of object. In addition, it is obscure between artifacts and real structures due to regular distribution of artifacts. Linear correction method was applied to suppress artifacts. The quality of reconstructed image is increased, and the accuracy of dimensional metrology is also improved.
- industry CT,
- beam hardening,
- cupping artifact,
- streak artifact,
- dimensional metrology

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