PIC simulation of high efficient injection of intense relative multi-beam

Li Lele; Huang Hua; Liu Zhenbang; Wang Ganping; Yuan Huan

doi:10.11884/HPLPB201628.160434

Volume 28 Issue 12

Nov. 2016

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Article Navigation > High Power Laser and Particle Beams > 2016 > 28(12): 123003

Ni Ruifang, Jiang Xiaodong, Huang Jin, et al. Effect of wavelength on damage of optical materials with SBS[J]. High Power Laser and Particle Beams, 2015, 27: 061020. doi: 10.11884/HPLPB201527.061020

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Li Lele, Huang Hua, Liu Zhenbang, et al. PIC simulation of high efficient injection of intense relative multi-beam[J]. High Power Laser and Particle Beams, 2016, 28: 123003. doi: 10.11884/HPLPB201628.160434

Ni Ruifang, Jiang Xiaodong, Huang Jin, et al. Effect of wavelength on damage of optical materials with SBS[J]. High Power Laser and Particle Beams, 2015, 27: 061020. doi: 10.11884/HPLPB201527.061020

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PIC simulation of high efficient injection of intense relative multi-beam

doi: 10.11884/HPLPB201628.160434

1.
Graduate School of Chinese Academy of Engineering Physics,Beijing 100088,China;
2.
Science and Technology on High Power Microwave Laboratory,Institute of Applied Electronics,CAEP,P.O.Box 919-1015,Mianyang 621900,China

Received Date: 2016-08-17
Rev Recd Date: 2016-10-10
Publish Date: 2016-12-15

Abstract

Abstract

This paper presents a simulation study on intense relative multi-beams(IRMBs) electron explosive emission and structure optimizing of cathodes in the relative klystron amplifier(RKA) diode with PIC simulation software. Three new kinds of structures for multi-beam cathodes are introduced. The result shows that, the traditional structure cathode could only get the injection coefficient of IRMBs up to 82%, while the new structure cathode could increase it to more than 95%, even 99%. This research gives a solution to the problem of low injection coefficient in the multi-beams RKA.
- multi-beam klystron,
- intense multiple electron beams,
- cathode structure,
- diode,
- injection coefficient

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