Volume 28 Issue 12
Nov.  2016
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Li Lele, Huang Hua, Liu Zhenbang, et al. PIC simulation of high efficient injection of intense relative multi-beam[J]. High Power Laser and Particle Beams, 2016, 28: 123003. doi: 10.11884/HPLPB201628.160434
Citation: Li Lele, Huang Hua, Liu Zhenbang, et al. PIC simulation of high efficient injection of intense relative multi-beam[J]. High Power Laser and Particle Beams, 2016, 28: 123003. doi: 10.11884/HPLPB201628.160434

PIC simulation of high efficient injection of intense relative multi-beam

doi: 10.11884/HPLPB201628.160434
  • Received Date: 2016-08-17
  • Rev Recd Date: 2016-10-10
  • Publish Date: 2016-12-15
  • This paper presents a simulation study on intense relative multi-beams(IRMBs) electron explosive emission and structure optimizing of cathodes in the relative klystron amplifier(RKA) diode with PIC simulation software. Three new kinds of structures for multi-beam cathodes are introduced. The result shows that, the traditional structure cathode could only get the injection coefficient of IRMBs up to 82%, while the new structure cathode could increase it to more than 95%, even 99%. This research gives a solution to the problem of low injection coefficient in the multi-beams RKA.
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