Laterally graded periodic Mo/B<sub>4</sub>C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm

Zhu Jingtao; Li Miao; Zhu Shengming; Zhang Jiayi; Ji Bin; Cui Mingqi

doi:10.11884/HPLPB201830.170492

Volume 30 Issue 6

Jun. 2018

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Zhu Jingtao, Li Miao, Zhu Shengming, et al. Laterally graded periodic Mo/B4C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm[J]. High Power Laser and Particle Beams, 2018, 30: 061001. doi: 10.11884/HPLPB201830.170492

Citation:

Zhu Jingtao, Li Miao, Zhu Shengming, et al. Laterally graded periodic Mo/B₄C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm[J]. High Power Laser and Particle Beams, 2018, 30: 061001. doi: 10.11884/HPLPB201830.170492

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Laterally graded periodic Mo/B₄C multilayer for extreme ultraviolet wavelength of 6.8-11.0 nm

doi: 10.11884/HPLPB201830.170492

1.
MOE Key Laboratory of Advanced Micro-structured Materials, School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
2.
Beijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China

Funds:

National Natural Science Foundation of China 11375131

National Natural Science Foundation of China U1432244

the Royal Society-NSFC International Exchanges Funding IE141043

the Royal Society-NSFC International Exchanges Funding 11511130051

More Information

Author Bio:
Zhu Jingtao(1978—), male, professor, engaged in EUV and soft X-ray optics; jtzhu@tongji.edu.cn
Received Date: 2017-12-08
Rev Recd Date: 2018-01-17
Publish Date: 2018-06-15

Abstract

Abstract

Laterally graded periodic [Mo/B₄C]₆₀ multilayer mirrors for an EUV interval of 6.8-11.0 nm were deposited by direct current magnetron sputtering on silicon substrate. The structure properties and performance of laterally graded [Mo/B₄C]₆₀ multilayers were investigated by grazing X-ray reflectivity measurements and synchrotron radiation reflectance measurements. The results show that the multilayer period thickness D-spacing varies linearly from 4.39 nm to 7.82 nm in the long direction of the sample, indicating the average D-spacing gradient of 0.054 nm/mm. Reflectance of all measured point on the mirror is about 10% at the incident angle of 45°. Spectral width (FWHM) of the reflectance peaks varies from 0.13 nm to 0.31 nm with the increase of multilayer period thickness.
- EUV,
- laterally graded periodic multilayer,
- Mo/B₄C,
- magnetron sputtering,
- synchrotron radiation

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References(17)

References

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