Application of image processing in dual-wavelength laser-induced damage growth of fused silica

Li Cui; Shi Jinfang; Qiu Rong; Ye Cheng; Guo Decheng; Jiang Yong

doi:10.11884/HPLPB202032.200076

Volume 32 Issue 8

Aug. 2020

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Article Navigation > High Power Laser and Particle Beams > 2020 > 32(8): 081004

Li Cui, Shi Jinfang, Qiu Rong, et al. Application of image processing in dual-wavelength laser-induced damage growth of fused silica[J]. High Power Laser and Particle Beams, 2020, 32: 081004. doi: 10.11884/HPLPB202032.200076

Citation:

Li Cui, Shi Jinfang, Qiu Rong, et al. Application of image processing in dual-wavelength laser-induced damage growth of fused silica[J]. High Power Laser and Particle Beams, 2020, 32: 081004. doi: 10.11884/HPLPB202032.200076

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Application of image processing in dual-wavelength laser-induced damage growth of fused silica

doi: 10.11884/HPLPB202032.200076

Li Cui^{1, 2
,},
Shi Jinfang^{1, 2
,
,},
Qiu Rong²,
Ye Cheng²,
Guo Decheng²,
Jiang Yong²

1.
School of Manufacturing Science and Engineering, Key Laboratory of Testing Technology for Manufacturing Process of Ministry of Education, Southwest University of Science and Technology, Mianyang 621010, China
2.
Joint Laboratory for Extreme Conditions Matter Properties, Southwest University of Science and Technology, Mianyang 621010, China

Received Date: 2020-03-24
Rev Recd Date: 2020-06-11
Publish Date: 2020-08-13

Abstract

Abstract

The damage growth threshold of fused silica optical elements under single-wavelength irradiation and dual-wavelength laser irradiation was studied based on image processing methods. Through real-time acquisition of the damage image and the spot spatial energy distribution, the energy density at the location where the damage growth occurs was obtained. Aiming at the experimental data of the damage growth of fused silica optical elements under $3\omega $ irradiation, $3\omega $ and $1\omega $ simultaneous irradiation, the differences between the results obtained by the image processing method and the traditional damage growth threshold R-on-1 measurement method (GB) were compared and analyzed. The results show that the image processing method used in this paper can solve the calculation error problems caused by the traditional method that the non-uniform spot with energy density distribution is equivalent to the flat top spot with uniform distribution when the damage of fused silica optical element increases under the non-uniform spot of small aperture irradiation, and reduce the effect of light spot caliber in damage (growth) threshold measurement.
- laser-induced damage growth threshold,
- fused silica,
- dual-wavelength,
- non-uniform spot of small aperture,
- image processing

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References(17)

References

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