Error-sensitive factors analysis and verification for optical element in-situ measurement device based on phase measuring deflectometry

Wang Shanshan; Shi Feng; Qiao Shuo; Xu Bowen; Hao Qun; Song Ci; Tie Guipeng; Tian Ye; Zhai Dede; Peng Xing

doi:10.11884/HPLPB202335.220405

Volume 35 Issue 9

Sep. 2023

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Article Navigation > High Power Laser and Particle Beams > 2023 > 35(9): 091002

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Wang Shanshan, Shi Feng, Qiao Shuo, et al. Error-sensitive factors analysis and verification for optical element in-situ measurement device based on phase measuring deflectometry[J]. High Power Laser and Particle Beams, 2023, 35: 091002. doi: 10.11884/HPLPB202335.220405

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Error-sensitive factors analysis and verification for optical element in-situ measurement device based on phase measuring deflectometry

doi: 10.11884/HPLPB202335.220405

Wang Shanshan^1
,,
Shi Feng^{2
,
,},
Qiao Shuo²,
Xu Bowen¹,
Hao Qun^{1, 3},
Song Ci²,
Tie Guipeng²,
Tian Ye²,
Zhai Dede²,
Peng Xing²

1.
Beijing Key Laboratory for Precision Optoelectronic Measurement Instrument and Technology, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China
2.
College of Intelligence Science, National University of Defense Technology, Changsha 410073, China
3.
School of Opto-Electronic Engineering, Changchun University of Science and Technology, Changchun 130022, China

Received Date: 2022-11-30
Accepted Date: 2023-05-27
Rev Recd Date: 2023-05-23

Available Online: 2023-07-13

Publish Date: 2023-09-01

Abstract

Abstract

Based on optical element’s high precision in-situ measurement requirements, this paper carries out the sensitive factor simulation analysis, studies the influence of systematic structural errors and temperature errors on the measurement results, and designs and builds an in-situ measurement device to carry out measurement experiments of system temperature change, system repeatability and system stability. The results show that the simulation detection model can be used for plane/spherical/aspherical/free surface, the influence on the measurement results is mainly reflected in the low frequency error, the high frequency error is relatively small, the maximum PV value of the measurement surface shape error does not exceed 68nm (about λ/10), and the maximum RMS value does not exceed 15 nm (about λ/40).
- shape measurement,
- in-situ measurement,
- optical element,
- error analysis,
- simulation model

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References(19)

References

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