Research progress and application of laser preconditioning technology for optical components

Zhang Jingjing; Yang Feng; Kou Yang; Wang Zhuohan; Yuan Lei; Gao Hongwei; Bo Yong; Peng Qinjun

doi:10.11884/HPLPB202335.230067

Volume 35 Issue 8

Jul. 2023

Turn off MathJax

Article Contents

Abstract

References

Article Navigation > High Power Laser and Particle Beams > 2023 > 35(8): 081001

Zong Zhaoyu, Zhao Junpu, Li Sen, et al. Precise laser pulse shaping technology and application with high energy stability[J]. High Power Laser and Particle Beams, 2022, 34: 031011. doi: 10.11884/HPLPB202234.210288

Citation:

Zhang Jingjing, Yang Feng, Kou Yang, et al. Research progress and application of laser preconditioning technology for optical components[J]. High Power Laser and Particle Beams, 2023, 35: 081001. doi: 10.11884/HPLPB202335.230067

Citation:

PDF( 6497 KB)

Research progress and application of laser preconditioning technology for optical components

doi: 10.11884/HPLPB202335.230067

Zhang Jingjing^{1, 2, 3
,},
Yang Feng^{1, 2
,
,},
Kou Yang^{1, 2},
Wang Zhuohan^{1, 2},
Yuan Lei^{1, 2},
Gao Hongwei^{1, 2
,
,},
Bo Yong^{1, 2},
Peng Qinjun^{1, 2}

1.
Key Laboratory of Solid State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China
2.
Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China
3.
University of Chinese Academy of Sciences, Beijing 100149, China

Received Date: 2023-03-30
Accepted Date: 2023-06-08
Rev Recd Date: 2023-06-15

Available Online: 2023-06-26

Publish Date: 2023-08-15

Abstract

Abstract

Defects and impurities in optical components can lead to significant reduction in the laser damage threshold, which has become a “bottleneck” in the development of high-power and high-energy laser devices and needs to be solved urgently. In the study of laser damage of optical components, it is found that the laser damage resistance of optical components can be effectively improved by pretreating the surface of the components with a laser below the damage threshold. In this paper, the background, qualitative mechanism, quantitative theoretical model and application status of laser conditioning technology are summarized, and a new film conditioning technology for in-situ real-time laser conditioning of thin films is introduced. Finally, it is pointed out that laser conditioning is one of the most effective methods that can effectively improve the laser induced damage threshold of optical films, optical glasses, and optical crystal components. However, its mechanism, practicality, and instrumentation still need further development.
- laser conditioning,
- optical films,
- defects and impurities,
- laser induced damage threshold

FullText(HTML)

References(78)

References

[1]	Manes K R, Spaeth M L, Adams J J, et al. Damage mechanisms avoided or managed for NIF large optics[J]. Fusion Science and Technology, 2016, 69(1): 146-249. doi: 10.13182/FST15-139
[2]	Manenkov A A, Prokhorov A M. Laser-induced damage in solids[J]. Soviet Physics Uspekhi, 1986, 29(1): 104-122. doi: 10.1070/PU1986v029n01ABEH003117
[3]	Runkel M J, Nostrand M C. Overview of raster scanning for ICF-class laser optics[C]//Proceedings of SPIE 4932, Laser-Induced Damage in Optical Materials: 2002 and 7th International Workshop on Laser Beam and Optics Characterization. 2003: 136-146.
[4]	Kozlowski M R, Wolfe C R, Staggs M C, et al. Large area laser conditioning of dielectric thin film mirrors[R]. Livermore, CA: Lawrence Livermore National Lab. , 1990: 376-392.
[5]	Stewart A F, Guenther A H, Domann F E. The properties of laser annealed dielectric films[C]//Proc of SPIE, 1988, 756: 369-387.
[6]	Brauns B, Schäfer D, Wolf R, et al. Effect of the substrate preparation with CO₂ laser radiation on the laser resistance of optical layers[J]. Thin Solid Films, 1986, 138(2): 157-162. doi: 10.1016/0040-6090(86)90389-5
[7]	Bessarab A V, Kormer S B, Pavlov D V, et al. Statistical relationship governing the surface damage of optical glass by wide laser radiation beams[J]. Soviet Journal of Quantum Electronics, 1977, 7(2): 181-185. doi: 10.1070/QE1977v007n02ABEH008865
[8]	Temple P A, Lowdermilk W H, Milam D. Carbon dioxide laser polishing of fused silica surfaces for increased laser-damage resistance at 1064 nm[J]. Applied Optics, 1982, 21(18): 3249-3255. doi: 10.1364/AO.21.003249
[9]	Zhao Yuanan, Wang Tao, Zhang Dawei, et al. Laser conditioning and multi-shot laser damage accumulation effects of HfO₂/SiO₂ antireflective coatings[J]. Applied Surface Science, 2005, 245(1/4): 335-339.
[10]	Ling Xiulan, Zhao Yuanan, Li Dawei, et al. Laser conditioning of high-reflective and anti-reflective coatings in vacuum environments[J]. Optics Communications, 2010, 283(13): 2728-2731. doi: 10.1016/j.optcom.2010.03.014
[11]	周业为, 谢建, 李育德. 光学薄膜激光预处理及其机理的研究[J]. 激光杂志, 1998, 19(5):5-7,17 Zhou Yewei, Xie Jian, Li Yude. Investigation of laser conditioning of optical coatings and the mechanisms[J]. Laser Journal, 1998, 19(5): 5-7,17
[12]	Zhu Meiping, Yi Kui, Li Dawei, et al. Influence of SiO₂ overcoat layer and electric field distribution on laser damage threshold and damage morphology of transport mirror coatings[J]. Optics Communications, 2014, 319: 75-79. doi: 10.1016/j.optcom.2014.01.014
[13]	肖清泉, 房迪, 赵珂杰, 等. 电子束蒸发方法研究Mg₂Si的薄膜及其光学带隙[J]. 红外与毫米波学报, 2017, 36(2):202-207 Xiao Qingquan, Fang Di, Zhao Kejie, et al. Preparation and optical bandgap of Mg₂Si film deposited by electron beam evaporation[J]. Journal of Infrared and Millimeter Waves, 2017, 36(2): 202-207
[14]	代福, 杨李茗. HfO₂/SiO₂多层高反膜激光预处理技术[J]. 强激光与粒子束, 2013, 25(4):929-934 doi: 10.3788/HPLPB20132504.0929 Dai Fu, Yang Liming. Laser conditioning methods for hafnia silica multilayer high-reflective coatings[J]. High Power Laser and Particle Beams, 2013, 25(4): 929-934 doi: 10.3788/HPLPB20132504.0929
[15]	Liu Hao, Chen Songlin, Wei Yaowei, et al. Laser conditioning on HfO₂ film monitored by calorimeter[J]. Optics Express, 2012, 20(1): 698-705. doi: 10.1364/OE.20.000698
[16]	Arenberg J W, Mordaunt D W. On the role of wavelength in the laser conditioning effect[J]. Laser Induced Damage in Optical Materials, 1987, 756: 430-439.
[17]	Kerr N C, Emmony D C. The effect of laser annealing on laser-induced damage threshold[J]. Journal of Modern Optics, 1990, 37(4): 787-802. doi: 10.1080/09500349014550851
[18]	Xu Shizhen, Yuan Xiaodong, Yin Wei, et al. Effect of UV laser conditioning on fused silica in vacuum[J]. Optical Materials, 2009, 31(6): 1013-1016. doi: 10.1016/j.optmat.2008.11.016
[19]	Hu Guohang, Zhao Yuanan, Li Dawei, et al. Transmittance increase after laser conditioning reveals absorption properties variation in DKDP crystals[J]. Optics Express, 2012, 20(22): 25169-25180. doi: 10.1364/OE.20.025169
[20]	Guéhenneux G, Bouchut P H, Veillerot M, et al. Impact of outgassing organic contamination on laser-induced damage threshold of optics: effect of laser conditioning[C]//Proceedings of SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 59910F.
[21]	Swain J E, Stokowski S E, Milam D, et al. The effect of baking and pulsed laser irradiation on the bulk laser damage threshold of potassium dihydrogen phosphate crystals[J]. Applied Physics Letters, 1982, 41(1): 12-14. doi: 10.1063/1.93319
[22]	Frink M E, Arenberg J W, Mordaunt D W, et al. Temporary laser damage threshold enhancement by laser conditioning of antireflection-coated glass[J]. Applied Physics Letters, 1987, 51(6): 415-417. doi: 10.1063/1.98407
[23]	Wolfe C R. Laser conditioning of optical thin films[C]//Proceedings of SPIE 1438, Laser-Induced Damage in Optical Materials 1989. 1990: 143810.
[24]	Bloembergen N. Laser-induced electric breakdown in solids[J]. IEEE Journal of Quantum Electronics, 1974, 10(3): 375-386. doi: 10.1109/JQE.1974.1068132
[25]	Jones S C, Braunlich P, Casper R T, et al. Recent progress on laser-induced modifications and intrinsic bulk damage of wide-gap optical materials[J]. Optical Engineering, 1989, 28: 281039.
[26]	Feit M D, Rubenchik A M, Trenholme J B. Simple model of laser damage initiation and conditioning in frequency conversion crystals[C]//Proceedings of SPIE 5991, Laser-Induced Damage in Optical Materials: 2005, 59910W.
[27]	Feit M D, Rubenchik A M. Implications of nanoabsorber initiators for damage probability curves, pulselength scaling, and laser conditioning[C]//Proceedings of SPIE 5273, Laser-Induced Damage in Optical Materials: 2003. 2004.
[28]	Dyan A, Pommiès M, Duchateau G, et al. Revisited thermal approach to model laser-induced damage and conditioning process in KH₂PO₄ and D_2xKH_2(1-x)PO₄ crystals[C]//Proceedings of SPIE 6403, Laser-Induced Damage in Optical Materials: 2006. 2006: 640307.
[29]	Liao Z M, Spaeth M L, Manes K, et al. Predicting laser-induced bulk damage and conditioning for deuterated potassium dihydrogen phosphate crystals using an absorption distribution model[J]. Optics Letters, 2010, 35(15): 2538-2540. doi: 10.1364/OL.35.002538
[30]	Liao Z M, Roussell R, Adams J J, et al. Defect population variability in deuterated potassium dihydrogen phosphate crystals[J]. Optical Materials Express, 2012, 2(11): 1612-1623. doi: 10.1364/OME.2.001612
[31]	Koldunov M, Manenkov A A. Theory of laser-induced inclusion-initiated damage in optical materials[J]. Optical Engineering, 2012, 51: 121811.
[32]	Duchateau G. Simple models for laser-induced damage and conditioning of potassium dihydrogen phosphate crystals by nanosecond pulses[J]. Optics Express, 2009, 17(13): 10434-10456. doi: 10.1364/OE.17.010434
[33]	Ferris K F, Chick L A, Exarhos G J, et al. Microstructural size effects on the dielectric response of inhomogeneous media[C]//Proceedings of SPIE 3244, Laser-Induced Damage in Optical Materials: 1997. 1998.
[34]	Brusasco R M, Penetrante B M, Butler J A, et al. CO₂-laser polishing for reduction of 351-nm surface damage initiation in fused silica[C]//Proceedings of SPIE 4679, Laser-Induced Damage in Optical Materials: 2001. 2002.
[35]	Brusasco R M, Penetrante B M, Butler J A, et al. Localized CO₂-laser treatment for mitigation of 351-nm damage growth in fused silica[C]//Proceedings of SPIE 4679, Laser-Induced Damage in Optical Materials: 2001. 2002.
[36]	赵松楠, 吕海兵, 任寰, 等. CO₂激光器在光学元件表面处理中的应用[J]. 激光与光电子学进展, 2006, 43(3):43-47 Zhao Songnan, Lv Haibing, Ren Huan, et al. Applications of CO₂ laser treatment in optical surface[J]. Laser and Optoelectronics Progress, 2006, 43(3): 43-47
[37]	黄进, 赵松楠, 吕海兵, 等. 利用1064 nm激光预处理提高pickoff镜损伤阈值[J]. 强激光与粒子束, 2007, 19(5):728-732 Huang Jin, Zhao Songnan, Lv Haibing, et al. Damage-threshold increase of pickoff optics using 1064nm wavelength laser[J]. High Power Laser and Particle Beams, 2007, 19(5): 728-732
[38]	Brusasco R M, Penetrante B M, Peterson J E, et al. UV-laser conditioning for reduction of 351-nm damage initiation in fused silica[C]//Proceedings of SPIE 4679, Laser-Induced Damage in Optical Materials: 2001. 2002.
[39]	Negres R A, DeMange P, Demos S G. Investigation of laser annealing parameters for optimal laser-damage performance in deuterated potassium dihydrogen phosphate[J]. Optics Letters, 2005, 30(20): 2766-2768. doi: 10.1364/OL.30.002766
[40]	魏朝阳, 赵元安, 贺洪波, 等. 光学薄膜元件的激光预处理技术[J]. 激光与光电子学进展, 2005, 42(5):51-55 Wei Chaoyang, Zhao Yuanan, He Hongbo, et al. Laser conditioning on optical thin film components[J]. Laser and Optoelectronics Progress, 2005, 42(5): 51-55
[41]	Stolz C J, Sheehan L M, Maricle S M, et al. Laser conditioning methods of hafnia-silica multilayer mirrors[C]//Proceedings of SPIE 3578, Laser-Induced Damage in Optical Materials: 1998. 1999.
[42]	DeMange P, Carr C W, Negres R A, et al. Laser annealing characteristics of multiple bulk defect populations within DKDP crystals[J]. Journal of Applied Physics, 2008, 104: 103103. doi: 10.1063/1.3000460
[43]	DeMange P, Negres R A, Carr C W, et al. Laser-induced defect reactions governing damage initiation in DKDP crystals[J]. Optics Express, 2006, 14(12): 5313-5328. doi: 10.1364/OE.14.005313
[44]	Adams J J, Weiland T L, Stanley J R, et al. Pulse length dependence of laser conditioning and bulk damage in KD₂PO₄[C]//Proceedings of SPIE 5647, Laser-Induced Damage in Optical Materials: 2004. 2005.
[45]	DeMange P, Carr C W, Negres R A, et al. Multiwavelength investigation of laser-damage performance in potassium dihydrogen phosphate after laser annealing[J]. Optics Letters, 2005, 30(3): 221-223. doi: 10.1364/OL.30.000221
[46]	Stolz C J, Weinzapfel C L, Rigatti A L, et al. Fabrication of meter-scale laser resistant mirrors for the National Ignition Facility: A fusion laser[C]//Proceedings of SPIE 5193, Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications. 2003.
[47]	Sheehan L M, Kozlowski M R, Rainer F, et al. Large-area conditioning of optics for high-power laser systems[C]// Proceedings of SPIE 2114, Laser-Induced Damage in Optical Materials: 1993. 1994.
[48]	Adams J J, Jarboe J A, Carr C W, et al. Results of sub-nanosecond laser conditioning of KD₂PO₄ crystals[C]//Proceedings of SPIE 6403, Laser-Induced Damage in Optical Materials: 2006. 2007: 64031M.
[49]	Burnham A K, Hackel L A, Wegner P J, et al. Improving 351-nm damage performance of large-aperture fused silica and DKDP optics[C]//Proceedings of SPIE 4679, Laser-Induced Damage in Optical Materials: 2001. 2002.
[50]	Carr C W, Auerbach J M. Effect of multiple wavelengths on laser-induced damage in KH_(2-x) D_xPO₄ crystals[J]. Optics Letters, 2006, 31(5): 595-597. doi: 10.1364/OL.31.000595
[51]	Fornier A, Cordillot C, Ausserre D, et al. Laser conditioning of optical coatings: some issues in the characterization by atomic force microscopy[C]//Proceedings of SPIE 2253, Optical Interference Coatings, 1994.
[52]	Staggs M C, Balooch M, Kozlowski M, et al. In-situ atomic-force microscopy of laser-conditioned and laser-damaged HfO₂/SiO₂ dielectric mirror coatings[C]//Proceedings of SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, 1991.
[53]	Kaiser N, Anton B, Jaenchen H, et al. Laser conditioning of LaF₃/MgF₂ dielectric coatings for excimer lasers[C]//Proceedings of SPIE 2428, Laser-Induced Damage in Optical Materials: 1994. 1995.
[54]	Melninkaitis A, Vaninas A, Mirauskas J, et al. Laser conditioning of high reflectivity mirrors used in OPOs by 266 and 355 nm nanosecond pulses[C]//Proceedings of SPIE 7504, Laser-Induced Damage in Optical Materials: 2009. 2009: 750408.
[55]	Demange P P, Negres R A, Radousky H B, et al. Differentiation of defect populations responsible for bulk laser-induced damage in potassium dihydrogen phosphate crystals[J]. Optical Engineering, 2006, 45: 104205. doi: 10.1117/1.2363166
[56]	Maunier C, Bertussi B, Damiani D, et al. Comparison of ns and sub-ns laser conditioning of KDP and DKDP crystals for high power lasers[C]//Proceedings of SPIE 6720, Laser-Induced Damage in Optical Materials: 2007. 2007: 67201L.
[57]	黄祖鑫, 蒋晓东, 任寰, 等. 激光预处理对光学元件膜层性能的影响[J]. 强激光与粒子束, 2004, 16(1):23-26 Huang Zuxin, Jiang Xiaodong, Ren Huan, et al. Study of laser conditioning influence on properties of optical films[J]. High Power Laser and Particle Beams, 2004, 16(1): 23-26
[58]	崔云, 赵元安, 晋云霞, 等. 激光预处理对增透膜阈值的影响[J]. 真空科学与技术学报, 2006, 26(4):321-325 Cui Yun, Zhao Yuanan, Jin Yunxia, et al. Influence of laser conditioning on laser induced damage threshold of antireflection layer[J]. Chinese Journal of Vacuum Science and Technology, 2006, 26(4): 321-325
[59]	Li Dawei, Zhao Yuanan, Shao Jianda, et al. 0.532-μm laser conditioning of HfO₂/SiO₂ third harmonic separator fabricated by electron-beam evaporation[J]. Chinese Optics Letters, 2008, 6(5): 386-387. doi: 10.3788/COL20080605.0386
[60]	Liu Jie, Li Xu, Yu Zhenkun, et al. Effect of laser conditioning on the LIDT of 532nm HfO₂/SiO₂ reflectors[C]//Proceedings of SPIE 8786, Pacific Rim Laser Damage 2013: Optical Materials for High Power Lasers. 2013: 87860Z.
[61]	刘杰, 张伟丽, 朱美萍. 532 nm HfO₂/SiO₂高反膜的激光预处理效应[J]. 强激光与粒子束, 2015, 27:032034 doi: 10.3788/HPLPB20152703.32034 Liu Jie, Zhang Weili, Zhu Meiping. Laser conditioning effect of HfO₂/SiO₂ high reflectors at 532 nm[J]. High Power Laser and Particle Beams, 2015, 27: 032034 doi: 10.3788/HPLPB20152703.32034
[62]	Li Zehan, Du Juan, Zhao Yuanan, et al. Modeling the effect of nanosecond laser conditioning on the femtosecond laser-induced damage of optical films[J]. Optics Express, 2015, 23(11): 14774-14783. doi: 10.1364/OE.23.014774
[63]	杨利红, 薛鹏成, 王涛, 等. 激光预处理对HfO₂光学薄膜微观性能的影响[J]. 光电子·激光, 2018, 29(2):187-196 Yang Lihong, Xue Pengcheng, Wang Tao, et al. Influence mechanism of laser conditioning on the microcosmic properties of HfO₂ optical thin films[J]. Journal of Optoelectronics·Laser, 2018, 29(2): 187-196
[64]	王建, 徐均琪, 李候俊, 等. 532nm激光辐照下ZnSe薄膜光学特性研究[J]. 应用光学, 2018, 39(6):929-935 Wang Jian, Xu Junqi, Li Houjun, et al. Optical properties of ZnSe film under 532nm laser irradiation[J]. Journal of Applied Optics, 2018, 39(6): 929-935
[65]	Csajbók V, Bedöhazi Z, Nagy B J, et al. Ultrafast multipulse damage threshold of femtosecond high reflectors[J]. Applied Optics, 2018, 57(2): 340-343. doi: 10.1364/AO.57.000340
[66]	Zhang Lijuan, Jiang Xiaolong, Chen Jing, et al. Effect of laser conditioning on surface modification and laser damage resistance of SiO₂ antireflection film[J]. Crystals, 2023, 13: 477. doi: 10.3390/cryst13030477
[67]	Guo Decheng, Jiang Xiaodong, Huang Jing, et al. Effect of UV laser conditioning on the structure of KDP crystal[J]. Advances in Condensed Matter Physics, 2014, 2014: 451048.
[68]	Wang Yueliang, Zhao Yuanan, Hu Guohang, et al. Mitigation of scattering defect and absorption of DKDP crystals by laser conditioning[J]. Optics Express, 2015, 23(12): 16273-16280. doi: 10.1364/OE.23.016273
[69]	王凤蕊, 李青芝, 郭德成, 等. KDP晶体激光预处理参数的优化[J]. 红外与激光工程, 2017, 46:0321005 Wang Fengrui, Li Qingzhi, Guo Decheng, et al. Laser pretreatment parameters optimization of KDP crystal[J]. Infrared and Laser Engineering, 2017, 46: 0321005
[70]	Wang Yao, Shao Jianda, Hu Guohang, et al. Laser-conditioning mechanism in KD₂PO₄ crystals revealed by fluorescence and Raman scattering analysis[J]. Optical Engineering, 2020, 59: 027105.
[71]	吴金明, 赵元安, 汪琳, 等. 1064 nm激光和355 nm激光同时辐照DKDP晶体的耦合预处理效应[J]. 中国激光, 2019, 46:0501003 doi: 10.3788/CJL201946.0501003 Wu Jinming, Zhao Yuanan, Wang Lin, et al. Coupling conditioning effect of DKDP crystals under simultaneous irradiation by 1064 nm laser and 355 nm laser[J]. Chinese Journal of Lasers, 2019, 46: 0501003 doi: 10.3788/CJL201946.0501003
[72]	Liu Zhichao, Geng Feng, Lei Xiangyang, et al. Effect of laser pulse duration and fluence on DKDP crystal laser conditioning[J]. Applied Optics, 2020, 59(17): 5240-5246. doi: 10.1364/AO.393097
[73]	刘志超, 许乔, 雷向阳, 等. 大口径氘化磷酸二氢钾晶体离线亚纳秒激光预处理技术[J]. 物理学报, 2021, 70:074208 doi: 10.7498/aps.70.20201524 Liu Zhichao, Xu Qiao, Lei Xiangyang, et al. Off-line sub-nanosecond laser conditioning on large aperture deuterated potassium dihydrogen phosphate crystal[J]. Acta Physica Sinica, 2021, 70: 074208 doi: 10.7498/aps.70.20201524
[74]	李云飞, 史晋芳, 邱荣, 等. 355 nm和1064 nm双波长预处理对DKDP晶体损伤性质的影响[J]. 强激光与粒子束, 2022, 34:061003 doi: 10.11884/HPLPB202234.220060 Li Yunfei, Shi Jinfang, Qiu Rong, et al. Effect of 355 nm and 1064 nm dual-wavelength conditioning on the bulk damage properties of DKDP crystal[J]. High Power Laser and Particle Beams, 2022, 34: 061003 doi: 10.11884/HPLPB202234.220060
[75]	赵元安, 连亚飞, 李婷, 等. KDP类晶体的激光损伤研究[J]. 强激光与粒子束, 2023, 35:071001 doi: 10.11884/HPLPB202335.220417 Zhao Yuanan, Lian Yafei, Li Ting, et al. Laser damage of KDP crystals and their analogues[J]. High Power Laser and Particle Beams, 2023, 35: 071001 doi: 10.11884/HPLPB202335.220417
[76]	Liu Zhichao, Zheng Yi, Zhang Qinghua, et al. Adaptive laser conditioning of reflective thin-film based on photo thermal lens probe[J]. Review of Scientific Instruments, 2017, 88: 124901. doi: 10.1063/1.5017187
[77]	Zhang Jian, Geng Feng, Liu Zhichao, et al. Elimination of X-rays irradiated defects in fused silica by laser conditioning[J]. Optics Communications, 2021, 483: 126639. doi: 10.1016/j.optcom.2020.126639
[78]	彭钦军, 申玉, 杨峰, 等. 一种提高光学薄膜损伤阈值的大面激光薄膜制备装置: CN109972095B[P]. 2021-02-26. Peng Qinjun, Shen Yu, Yang Feng, et al. A large area laser thin film preparation device for improving the damage threshold of optical thin films:CN109972095B[P]. 2021-02-26

Relative Articles

[1]	Li Yunfei, Shi Jinfang, Qiu Rong, Yu Jian, Guo Decheng, Zhou Lei. Effect of 355 nm and 1064 nm dual-wavelength conditioning on the bulk damage properties of DKDP crystal[J]. High Power Laser and Particle Beams, 2022, 34(6): 061003. doi: 10.11884/HPLPB202234.220060
[2]	Cheng Yong, Lu Yimin, Tang Huang, Guo Yanlong, Huang Guojun, Liu Xu. Researches on laser damage resistance of optical films[J]. High Power Laser and Particle Beams, 2016, 28(07): 070201. doi: 10.11884/HPLPB201628.070201
[3]	Wei Yaowei, Zhang Zhe, Liu Hao, Ouyang Sheng, Zheng Yi, Tang Gengyu, Chen Songlin, Ma Ping. Laser conditioning effect on HfO₂/SiO₂ film[J]. High Power Laser and Particle Beams, 2013, 25(12): 3338-3342. doi: 3338
[4]	Zheng Yi, Liu Zhichao, Ma Ping, Chen Songlin, Zhang Qinghua. Laser conditioning technique of mid-size laser spot[J]. High Power Laser and Particle Beams, 2013, 25(12): 3180-3184. doi: 3180
[5]	Zhang Zhe, Liu Hao, Chen Songlin, Ma Ping. Phenomenological model to understand weak absorption decreasing curves[J]. High Power Laser and Particle Beams, 2013, 25(12): 3318-3324. doi: 3318
[6]	Dai Fu, Yang Liming. Laser coverage on defect in laser conditioning process[J]. High Power Laser and Particle Beams, 2012, 24(06): 1385-1390. doi: 10.3788/HPLPB20122406.1385
[7]	zhang chunlai, li xibin, yuan xiaodong, wang zhiguo, zu xiaotao, . Influence of impurities on laser-induced damage of sol-gel SiO2 films[J]. High Power Laser and Particle Beams, 2011, 23(05): 0- .
[8]	zhou gang, ma bin, jiao hongfei, ding tao, zhang jinlong, shen zhengxiang, cheng xinbin, wang zhanshan. Laser damage threshold measurements of 1 064 nm high-reflection mirrors[J]. High Power Laser and Particle Beams, 2011, 23(04): 0- .
[9]	liu guanghui, xue chunrong, jin yunxia, zhang weili, fang ming, he hongbo, fan zhengxiu. Characterization of optical and microstructure properties of ultraviolet Sc₂O₃ thin films and their damage mechanism at high laser power[J]. High Power Laser and Particle Beams, 2010, 22(08): 0- .
[10]	ling xiulan, zhao yuan, li dawei, shao jianda, fan zhengxiu. Laser-induced damage of optical films in vacuum environments[J]. High Power Laser and Particle Beams, 2010, 22(10): 0- .
[11]	li xiaoguang, shen jun. Research progress in laser induced damage on optical films[J]. High Power Laser and Particle Beams, 2010, 22(10): 0- .
[12]	li da-wei, tao chun-xian, zhao yuan-an, shao jian-da, fan zheng-xiu. Computer simulation and optimization of raster scanning Nd:YAG laser conditioning[J]. High Power Laser and Particle Beams, 2008, 20(08): 0- .
[13]	dai fu, xiong sheng-ming. Laser beam diameter effect on temperature rise of films[J]. High Power Laser and Particle Beams, 2007, 19(12): 0- .
[14]	yuan lei, zhao yuan-an, he hong-bo, shao jian-da, fan zheng-xiu. Single-pulse and multi-pulse femtosecond laser damage of optical single films[J]. High Power Laser and Particle Beams, 2006, 18(04): 0- .
[15]	zhang dong-ping, zhang da-wei, fan shu-hai, huang jian-bing, zhao yuan-an, shao jian-da, fan zheng-xiu. Using ion post-treatment technique to improve laser-induced damage threshold of thin films[J]. High Power Laser and Particle Beams, 2005, 17(02): 213- .
[16]	jiang teng-jiao, huang wei, qi wen-zong, ling xiu-lan, yang fu, zhang bin, cai bang wei. Ｔhin film weak absorption of 3.8μm and 2.8μm laser measured by surface thermal lensing technique[J]. High Power Laser and Particle Beams, 2004, 16(12): 0- .
[17]	huang zu-xin, jiang xiao-dong, ren huan, zhong wei, ye lin, li ke, l hai-bing. Study of laser conditioning influence on properties of optical films[J]. High Power Laser and Particle Beams, 2004, 16(01): 0- .
[18]	yang fu, huang wei, zhang bin, qi wen-zong, cai bang-wei. Measurement of weak absorption of thin film coatings irradiated by 10.6μm laser[J]. High Power Laser and Particle Beams, 2004, 16(03): 0- .
[19]	jiang xiao-dong, huang zu-xing, ren huan, peng jing, ye lin, tang can. Study of laser conditioning process for optical films[J]. High Power Laser and Particle Beams, 2002, 14(03): 0- .
[20]	gan rong-bing, lin li-bin, jiang xiao-dong, huang zu-xin, zhong wei, zheng wan-guo, ye lin. Determinant of laser-induced-damage of thin film by the scan of transmission and reflectance[J]. High Power Laser and Particle Beams, 2002, 14(01): 0- .