DMH镀金体系在ICF空腔靶中的应用

Yang Xiaowei; An Maozhong; Zhang Yunwang; Zhang Lin

doi:10.3788/HPLPB20122405.1111

Volume 24 Issue 05

Jun. 2016

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Yang Xiaowei, An Maozhong, Zhang Yunwang, et al. DMH镀金体系在ICF空腔靶中的应用[J]. High Power Laser and Particle Beams, 2012, 24: 1111-1116. doi: 10.3788/HPLPB20122405.1111

Citation:

Yang Xiaowei, An Maozhong, Zhang Yunwang, et al. DMH镀金体系在ICF空腔靶中的应用[J]. High Power Laser and Particle Beams, 2012, 24: 1111-1116. doi: 10.3788/HPLPB20122405.1111

Yang Xiaowei, An Maozhong, Zhang Yunwang, et al. DMH镀金体系在ICF空腔靶中的应用[J]. High Power Laser and Particle Beams, 2012, 24: 1111-1116. doi: 10.3788/HPLPB20122405.1111

Citation:

Yang Xiaowei, An Maozhong, Zhang Yunwang, et al. DMH镀金体系在ICF空腔靶中的应用[J]. High Power Laser and Particle Beams, 2012, 24: 1111-1116. doi: 10.3788/HPLPB20122405.1111

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DMH镀金体系在ICF空腔靶中的应用

doi: 10.3788/HPLPB20122405.1111

1.
School of Chemical Engineering and Technology,Harbin Institute of Technology,Harbin 150001,China;
2.
Research Center of Laser Fusion,CAEP,P.O.Box 919-987,Mianyang 621900,China

Received Date: 2011-09-27
Publish Date: 2012-05-15

Abstract

Abstract

将 5,5-二甲基乙内酰脲(DMH)新型无氰电镀体系应用于惯性约束聚变金空腔靶制备中。利用扫描电镜和库仑计法研究了以DMH为配位剂的镀液组成和工艺条件对电镀金层质量等的影响。结果表明:该镀液体系具有良好的稳定性，控制镀液中金盐质量浓度为8 g/L，DMH质量浓度为80 g/L时，在阴极电流密度1.5 A/dm2、pH值9~10、温度45 ℃的条件下，可制得结晶致密、厚度均一的金镀层。
- inertial confinement fusion,
- hohlraum target,
- non-cyanide gold electrodeposition,
- dmh