| Citation: | Chen Jian, Wang Zhenguo, Wu Jiping, et al. 等截面超-超引射器流场结构及引射性能[J]. High Power Laser and Particle Beams, 2012, 24: 1301-1305. doi: 10.3788/HPLPB20122406.1301
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为考察超声速引射器直接引射超声速二次流时的性能，采用纹影技术和压力测量手段对一等截面超-超引射器的流场结构及其引射性能进行了实验研究。研究结果表明:一、二次流交汇后在混合室前段形成了复杂的超声速流场结构。根据二次流在混合室入口流动状态的不同，可将超-超引射划分为非饱和超-超引射和饱和超-超引射两种工作状态；二次流在混合室入口处产生的激波提高了引射器的压力匹配性能；在给定的引射系数下，引射器的增压性能随二次流马赫数的增大而降低，而引射马赫数对引射器压力恢复性能的影响不大。
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