Narrowband multilayers with low <em>Z</em> materials

Wu Wenjuan; Zhu Jingtao; Zhang Zhong; Wang Fengli; Chen Lingyan; Zhou Hongjun; Huo Tonglin

doi:10.3788/HPLPB20122408.1785

Volume 24 Issue 08

Nov. 2012

Turn off MathJax

Article Contents

Abstract

References

Article Navigation > High Power Laser and Particle Beams > 2012 > 24(08): 1785-1788

Wu Wenjuan, Zhu Jingtao, Zhang Zhong, et al. Narrowband multilayers with low Z materials[J]. High Power Laser and Particle Beams, 2012, 24: 1785-1788. doi: 10.3788/HPLPB20122408.1785

Citation:

Wu Wenjuan, Zhu Jingtao, Zhang Zhong, et al. Narrowband multilayers with low Z materials[J]. High Power Laser and Particle Beams, 2012, 24: 1785-1788. doi: 10.3788/HPLPB20122408.1785

Wu Wenjuan, Zhu Jingtao, Zhang Zhong, et al. Narrowband multilayers with low Z materials[J]. High Power Laser and Particle Beams, 2012, 24: 1785-1788. doi: 10.3788/HPLPB20122408.1785

Citation:

Wu Wenjuan, Zhu Jingtao, Zhang Zhong, et al. Narrowband multilayers with low Z materials[J]. High Power Laser and Particle Beams, 2012, 24: 1785-1788. doi: 10.3788/HPLPB20122408.1785

PDF( 1420 KB)

Narrowband multilayers with low Z materials

doi: 10.3788/HPLPB20122408.1785

1.
College of Sciences,Shanghai Institute of Technology,Shanghai 201418,China; 2.Institute of Precision Optical Engineering,Department of Physics,Tongji University,Shanghai 200092,China; 3.National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029,China

Received Date: 2011-07-14
Publish Date: 2012-08-15

Abstract

Abstract

Mo/Si multilayer are normally used in the early extreme ultraviolet (EUV) astronomical observation. In recent years people want to get observations in higher spectral resolution. Multilayer with low=Z materials have been studied. Four kinds of multilayer, Mg/SiC, Si/SiC, Si/B4C and Si/C multilayer were designed at the wavelength of 30.4 nm and compared with the normal Mo/Si multilayer. All the multilayer were prepared with DC magnetron sputtering, and their reflectivities were measured by synchrotron radiation. The results show that the bandwidth of Mg/SiC multilayer is 1.44 nm, which is the smallest, and the reflectivity is 44%, which is the highest. While the reflectivity of Mo/Si multilayer is only 24% and the bandwidth is 3.11 nm. The bandwidths of multilayer of low=Z materials are narrower than that of the normal multilayer. Therefore, multilayer of low=Z materials can be used in the EUV high spectral resolution field.
- multilayer,
- bandwidth,
- lowzmaterials,
- magnetronsputtering,
- synchrotronradiation

FullText(HTML)

References(0)

References

Relative Articles

[1]	Tan Bozhong, Li Yinghua, Zhang Lin, Li Jianming, Yang Qingguo. Study on M-band radiation spectrum of laser driven multilayer composite target[J]. High Power Laser and Particle Beams, 2023, 35(8): 081004. doi: 10.11884/HPLPB202335.230018
[2]	Wang Kun, Song Xupeng, Liu Kefu. Analysis and experiment on bandwidth characteristics of flexible high-power pulse feeder line[J]. High Power Laser and Particle Beams, 2017, 29(07): 075001. doi: 10.11884/HPLPB201729.170050
[3]	Song Heng, Chen Dongqun, Wang Yuwei, Li Da, Lv Yankui. Simulation and design of electric-magnetic vibrator combined antenna for radiation of wideband high power microwave[J]. High Power Laser and Particle Beams, 2016, 28(03): 033027. doi: 10.11884/HPLPB201628.033027
[4]	Yi Qiang, Huang Qiushi, Wang Xiangmei, Yang Yang, Zhang Zhong, Wang Zhanshan, Xu Rongkun, Peng Taiping, Zhou Hongjun, Huo Tonglin. Narrow-band Si/Mo/C multilayer mirrors working at 13 nm[J]. High Power Laser and Particle Beams, 2016, 28(12): 122002. doi: 10.11884/HPLPB201628.160440
[5]	Zhao Yajuan, Wang Donghong, Li Baoyi, Wang Peng, Zhou Bicheng, Jiang Bo. Enhancement of gain for dual-band microstrip antenna based on left-handed materials[J]. High Power Laser and Particle Beams, 2015, 27(10): 103254. doi: 10.11884/HPLPB201527.103254
[6]	Liu Yansong, Xu Hua, Li Jun, He Zhibing. Studies of fabrication Mo coatings on microsphere surface by magnetron sputtering[J]. High Power Laser and Particle Beams, 2014, 26(12): 124104. doi: 10.11884/HPLPB201426.124104
[7]	He Shifeng, Tu Yuchun, Feng Zhixiang, Yue Shuaipeng, Wang Fengli, Zhu Jingtao. Stress analysis of high reflective multilayers fabricated by magnetron sputtering[J]. High Power Laser and Particle Beams, 2014, 26(05): 054002. doi: 10.11884/HPLPB201426.054002
[8]	tan moyan, zhu jingtao, wang zhanshan. Design of reflective multilayer polarizers in extreme ultraviolet range using different merit functions[J]. High Power Laser and Particle Beams, 2011, 23(04): 0- .
[9]	jiang li, wang xiaoqiang, tan moyan, huang qiushi, li haochuan, zhou sika, zhu jingtao, wang zhanshan. Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm[J]. High Power Laser and Particle Beams, 2011, 23(05): 0- .
[10]	huang qiushi, li haochuan, zhu jingtao, wang xiaoqiang, jiang li, wang zhanshan, tang yongjian. Stress analysis of W, WSi2, Si single layers and W/Si, WSi2/Si ultilayers fabricated by magnetron sputtering[J]. High Power Laser and Particle Beams, 2011, 23(06): 0- .
[11]	tu yuchun, song zhuqing, huang qiushi, zhu jingtao, xu jing, wang zhanshan, li yizhou, liu jiaqi, zhang li. Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2011, 23(09): 0- .
[12]	zhao songnan, lü haibing, wang tao, yuan xiaodong, zheng wanguo. Detection of multi-layer interface structure[J]. High Power Laser and Particle Beams, 2010, 22(02): 0- .
[13]	pan lei, wang xiaoqiang, zhang zhong, zhu jingtao, wang zhanshan, li yizhou, li hongjie, wang daorong, zhao juyan, lu wei. Fabrication of high uniformity Mo/Si multilayer with 120 mm diameter using magnetron sputtering[J]. High Power Laser and Particle Beams, 2010, 22(07): 0- .
[14]	zheng xiu-ping, wu yong-gang, fu lian-xiao, wang zhen-hua, cao hong, zhang li, jiao hong-fei, peng dong-gong. Al and MgF2 multi-layer filters and their environmental stability[J]. High Power Laser and Particle Beams, 2008, 20(02): 0- .
[15]	duan ling-long, wu wei-dong, he zhi-bing, xu hua, tang yong-jian, xu jin-cheng. Effects of negative bias on structure and surface topography of Titanium films deposited by DC magnetron sputtering[J]. High Power Laser and Particle Beams, 2008, 20(03): 0- .
[16]	li xi-bo, tang xiao-hong, wu wei-dong, tang yong-jian, wang hong-yan, yang xiang-dong. Preparation and characterization of gold nanoparticles by magnetron sputtering technique[J]. High Power Laser and Particle Beams, 2006, 18(06): 0- .
[17]	gu chun-shi, wang zhan-shan, wang feng-li, zhang zhong, mu bao-zhong, qin shu-ji, chen ling-yan. Development of X-ray supermirrors used in Kirkpatrick-Baez microscope[J]. High Power Laser and Particle Beams, 2006, 18(07): 0- .
[18]	wang zhan-shan, zhang zhong, wang feng-li, wu wen-juan, wang hong-chang, qin shu-ji, chen ling-yan. Fabrication of the multilayer beam splitters with large area for soft Xray laser interferometer[J]. High Power Laser and Particle Beams, 2004, 16(09): 0- .
[19]	jin chun-shui, lin qiang, ma yue-ying, pei shu, cao jian-lin. Study of uniform soft X-ray multilayers deposition technology[J]. High Power Laser and Particle Beams, 2003, 15(05): 0- .
[20]	wang zhan-shan, wuyong-gang, tang wei-xing, qin shu-ji, zhou bin, chen ling-yan. Soft X-ray multilayers and filters[J]. High Power Laser and Particle Beams, 2002, 14(03): 0- .