Effect of returning electrons on stability of relativistic klystron amplifier

ChenYongdong; Xie Hongquan; Li Zhenghong; Wu Yang; Huang Hua; Zhou Zigang

doi:10.3788/HPLPB20132507.1770

Volume 25 Issue 07

May 2013

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Article Navigation > High Power Laser and Particle Beams > 2013 > 25(07): 1770-1774

Zhu Yufeng, Shi Lei, Fan Yajun, et al. Application of forming-line pulse-compression in ultra-wide-spectrum technology[J]. High Power Laser and Particle Beams, 2013, 25: 2448-2452. doi: 10.3788/HPLPB20132509.2448

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ChenYongdong, Xie Hongquan, Li Zhenghong, et al. Effect of returning electrons on stability of relativistic klystron amplifier[J]. High Power Laser and Particle Beams, 2013, 25: 1770-1774. doi: 10.3788/HPLPB20132507.1770

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Effect of returning electrons on stability of relativistic klystron amplifier

doi: 10.3788/HPLPB20132507.1770

1.
School of Science,Sichuan University of Science and Engineering,Zigong 643000,China;
2.
Science and Technology on High Power Microwave Laboratory,Institute of Applied Electronics,CAEP,Mianyang 621900,China;
3.
School of Science,Southwest University of Science and Technology,Mianyang 621010,China

Received Date: 2012-11-01
Rev Recd Date: 2012-12-10
Publish Date: 2013-05-02

Abstract

Abstract

Several factors causing electrons to return, e. g. the voltage and current of electron beam, the injected power of microwave are studied in relativistic klystron amplifier (RKA). In PIC simulation, we find that high injected power, high beam current and low beam voltage all can cause the return of electrons. Moreover the effect of returning electrons on the stability of RKA is studied, which shows that returning electrons will lead to self-excited oscillation of RKA and to the fail of locking of phase and frequency, and thus the device can not work stably.
- high power microwave,
- relativistic klystron amplifier,
- returning electron,
- self-excited oscillation

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