Controlled preparation of SiO<sub>2</sub> particles in T-junction microchannel by simulation and experiment

Li Zefu; Fang Yu; Luo Xuan; Gao Cunmei; Zhang Lin

doi:10.3788/HPLPB20132508.1956

Volume 25 Issue 08

Nov. 2013

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Li Zefu, Fang Yu, Luo Xuan, et al. Controlled preparation of SiO2 particles in T-junction microchannel by simulation and experiment[J]. High Power Laser and Particle Beams, 2013, 25: 1956-1960. doi: 10.3788/HPLPB20132508.1956

Citation:

Li Zefu, Fang Yu, Luo Xuan, et al. Controlled preparation of SiO₂ particles in T-junction microchannel by simulation and experiment[J]. High Power Laser and Particle Beams, 2013, 25: 1956-1960. doi: 10.3788/HPLPB20132508.1956

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Controlled preparation of SiO₂ particles in T-junction microchannel by simulation and experiment

doi: 10.3788/HPLPB20132508.1956

Li Zefu^1,2,
Fang Yu²,
Luo Xuan²,
Gao Cunmei^1,2,
Zhang Lin^1,2

1.
School of Materials Science and Engineering,Southwest University of Science and Technology,Mianyang 621010,China;
2.
Research Center of Laser Fusion,CAEP,P.O.Box 919-987-7,Mianyang 621900,China

Received Date: 2012-12-21
Rev Recd Date: 2013-03-25
Publish Date: 2013-06-19

Abstract

Abstract

A numerical simulation was processed to investigate the main factors of droplet diameter formatted in the T-junction microchannel, and to verify from the experiment. The results showed that the main factors influencing droplets diameter were the geometry ratio of discrete phase inlet and the continuous phase inlet (2l10) as well as the velocity ratio (4k16), silicon particles with diameters of 50, 80, 120 m (l=5, k=4, 6, 10) reached spherical degree above 93%, monodispersity, CV5% of statistics. In conclusion, the numerical simulation and experiment were in good consistency.
- silicon,
- T-junction,
- particles,
- microfluidic