Volume 25 Issue 08
Nov.  2013
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Peng Kai, Liu Dagang, Yang Changhong, et al. Improved 3D electromagnetic PIC system parallel algorithm[J]. High Power Laser and Particle Beams, 2013, 25: 732-736. doi: 10.3788/HPLPB20132503.0732
Citation: Shan Haiyang, Xu Xueke, He Hongbo, et al. Optical polishing pitch for continuous polishing of large-aperture laser glass[J]. High Power Laser and Particle Beams, 2013, 25: 1989-1994. doi: 10.3788/HPLPB20132508.1989
shu

Optical polishing pitch for continuous polishing of large-aperture laser glass

doi: 10.3788/HPLPB20132508.1989
  • 1.

    Key Laboratory of Materials for High Power Laser,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;

  • 2.

    University of Chinese Academy of Sciences,Beijing 100049,China

  • Received Date: 2012-11-30
  • Rev Recd Date: 2013-02-04
  • Publish Date: 2013-06-19
    Abstract
  • Four types of optical polishing pitches with different contents of pitch and rosin were prepared, and the morphology, penetration, glass transition temperature, softening point and viscosity of these polishing pitches were investigated. Three physical states of the polishing pitches were analyzed based on the composition and structure using glass transition temperature and softening point as the transition temperatures of physical states. It was experimentally found that the polishing pitch with the pitch and rosin mass rate of 30% and 70% could be well applied to large-aperture laser glass. It provides an advantage for controlling the astigmatism and surface defect efficiently. Quantitative studies on physical parameters of optical polishing pitch is beneficial for the preparation, quality inspection and stable performance of optical polishing pitch, and could also improve the polishing efficiency of large-aperture laser glass.
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