Influencing factors of Au nanowires fabricated in porous aluminum oxide template by AC electrodeposition

The Au nanowires were formed in porous aluminum oxide template by AC electrodeposition method, and the influence of the thickness of barrier layer, voltage and frequency in the AC plating progress was discussed. The diameter of Au nanowires was 30 nm, and the average length was 2.1 m. The results show that the thickness of the barrier layer would significantly influence the deposition potential, which turned to be the key factor of the deposition process. The current-time curves were recorded to analyze the AC electrodeposition process, showing that the length of nanowires increased proportionately with the alternating voltage, and the stable current of the reaction increased with the frequency. These facts can be explained by the semiconductor property of the barrier layer.