Transverse emittance measurement of high-current single pulse beams using pepper-pot method

A pepper pot-imaging plate system has been developed and used to measure the 4-D transverse emittance of a vacuum arc ion source. Single beam pulses of tens to hundreds milliamperes were extracted from the plasma with 64 kV high voltage. An imaging plate was laid after the pepper pot to visualize the ion beamlets passing though the holes on the pepper pot. An application program was developed to show the phase-space distribution and calculate the ellipse and RMS emittances. The normalized RMS emittances are about 6.41 mmmrad in x-direction and 4.61 mmmrad in y-direction. It is shown that the emittance of the vacuum arc ion source is much larger than that of other types of ion sources, which is mainly attributed to the high current and the convex meniscus of this source.