Fabrication of two-scale texture by laser lithography

Systems of two-beam interference lithography and laser rapid scanning lithography were constructed. Gratings with different period and depth were fabricated over large areas by laser interference lithography. Utilizing the two-dimensional scan function of laser rapid scanner, exposure and distance between stuffers were optimized by controlling laser power and scanning speed. Two methods for two-scale texture fabrication were presented. The first one was that photoresist which had been scanned in x and y directions by scanning lithography was exposed in interference lithography system. The second one was that photoresist was exposed twice with different incidence angle in interference lithography system. The results show that the two methods were fast, cheap and controllable for two-scale texture fabrication.