chen xian-zhong, yao han-min, chen xu-nan. Application of metastable helium atomic beam in nanostructure fabrication[J]. High Power Laser and Particle Beams, 2003, 15.
Citation:
chen xian-zhong, yao han-min, chen xu-nan. Application of metastable helium atomic beam in nanostructure fabrication[J]. High Power Laser and Particle Beams, 2003, 15.
chen xian-zhong, yao han-min, chen xu-nan. Application of metastable helium atomic beam in nanostructure fabrication[J]. High Power Laser and Particle Beams, 2003, 15.
Citation:
chen xian-zhong, yao han-min, chen xu-nan. Application of metastable helium atomic beam in nanostructure fabrication[J]. High Power Laser and Particle Beams, 2003, 15.
State Key Laboratory of Optical Technologies for Microfabrication,Institute of Optics andElectronics,the Chinese Academy of Sciences,P.O.Box 350,Shuangliu,Chengdu 610209,China
Two new methods using metastable helium atomic beam to fabricate nanostructures are introduced. A metastable helium atomic beam effusing out of atom source is firstly cooled by transversally in cident laser. This well-collimated atomic beam traveling through the light standingwave whose direction is perpendicular to atomic beam is quenched, and channeling effect happens in atomic density distribution. In this paper the basic principle of this technique based on mask made of light and theoretical analysis as well as simulation results are given. The principle of another method based on physical mask and SAM(selfassembled monolayers) resists are presented, the SAM on substrate is destroyed by deposited metastable atoms on substrate, and the nanometer-scale structure will be fabricated wi