Volume 14 Issue 03
Jun.  2002
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xu yan, lan ke, lai dong-xian, et al. Impact of tamped sample target structure on production of uniform plasmas[J]. High Power Laser and Particle Beams, 2002, 14.
Citation: xu yan, lan ke, lai dong-xian, et al. Impact of tamped sample target structure on production of uniform plasmas[J]. High Power Laser and Particle Beams, 2002, 14.

Impact of tamped sample target structure on production of uniform plasmas

  • Publish Date: 2002-06-15
  • The X-ray radiation can be used in heating sandwich type tamped sample targets to produce a uniform plasmas, which is essential for absorption spectrum measurement experiments to provide mean ingful quantitative data on radiative and material properties. With 1D multi-gr oup radiation transport program, this paper studies the impact of those target's structure on the plasma states produced by X-ray heating. A CH layers tamped iron target is heated by X-ray from one side in our simulation. In order to prod uce a uniform plasma states at a moment, the scale of plasma produced must be shorter than the heat conducting distances, which determines the initial thickness of iron samples. The thickness of CH layer has obvious confining effect on the plasma expansion, it also affects the uniform pla
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